Thin film transistor-liquid crystal display (TFT-LCD) array substrate, manufacturing method and disconnection maintenance method
A technology of an array substrate and a manufacturing method, which is applied in the field of TFT-LCD array substrates, can solve problems such as taking a long time and affecting the efficiency of disconnection maintenance, and achieve the effect of improving efficiency
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Embodiment 1
[0050] In this embodiment, taking the example that the TFT-LCD array substrate contains a puncture structure electrically connected to the gate line, and the base of the puncture structure is arranged on the same layer as the gate line, the TFT-LCD provided in the embodiment of the present invention The LCD array substrate is further described.
[0051] The TFT-LCD array substrate in this embodiment includes a gate line 1, a data line 2, and several pixel units defined by the gate line 1 and the data line 2, and a thin film transistor 3 and a pixel electrode 4 are formed in each pixel unit; Wherein, at least two puncture structures 5 are formed in the adjacent area of the gate line in the pixel unit, and the puncture structures 5 include a base 51 and a penetrating insulating layer 6 formed on the base 51 (the insulating layer 6 in this embodiment). Layer 6 includes spikes 52 of a gate insulating layer and a passivation layer); moreover, the gate line 1 is electrically conne...
Embodiment 2
[0058] In this embodiment, the TFT-LCD array substrate provided by the embodiment of the present invention is further described by taking the puncture structure electrically connected to the data line included in the TFT-LCD array substrate as an example.
[0059] like Figure 5 As shown, the TFT-LCD array substrate in this embodiment includes a gate line 1, a data line 2, and several pixel units defined by the gate line 1 and the data line 2, and a thin film transistor 3 and a pixel unit are formed in each pixel unit. An electrode 4; wherein, at least two puncture structures 5 are formed in the adjacent area of the data line in the pixel unit, and the puncture structures 5 include a base 51 and a penetrating insulating layer 6 formed on the base 51 (this embodiment The insulating layer 6 in the passivation layer only includes the spikes 52 of the passivation layer; moreover, the data line 2 is electrically connected to the substrate 51 .
[0060] Specifically, how to elect...
Embodiment 3
[0069] like Figure 9 As shown, the manufacturing method of the TFT-LCD array substrate provided in this embodiment includes:
[0070]Step 1, forming a gate line layer, an active layer, a data line layer, an insulating layer, and a pixel electrode layer on the substrate, wherein, while forming a gate line or a data line, forming a patterning process that is electrically connected to the gate line or the data line The base of the puncture structure of sexual connection; the base of the puncture structure is not covered with a metal barrier layer, and the puncture structure is formed on the conductive pattern or in a region adjacent to the conductive pattern;
[0071] The conductive pattern here can be one of any metal wires that may have poor disconnection (such as gate lines, data lines, common electrode lines, etc.), or a combination of any of the above-mentioned metal wires that may have poor disconnection. Combination of light bars.
[0072] Step 2, performing heat treatm...
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