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Heated electrostatic chuck with mechanical gripping capability at high temperature

A technology of mechanical clamps and electrostatic clamps, which is used in the manufacture of circuits, electrical components, semiconductor/solid-state devices, etc., and can solve problems such as the adverse effects of electrostatic clamping force.

Active Publication Date: 2016-05-04
AXCELIS TECHNOLOGIES
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, such high temperatures (e.g., close to 1000°C) may adversely affect the electrostatic clamping force exhibited by conventional ESCs

Method used

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  • Heated electrostatic chuck with mechanical gripping capability at high temperature
  • Heated electrostatic chuck with mechanical gripping capability at high temperature
  • Heated electrostatic chuck with mechanical gripping capability at high temperature

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Experimental program
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Embodiment Construction

[0018] The inventors have now discovered that high temperature processing can adversely affect the clamping force between the workpiece and the electrostatic gripper, where it is believed that the dielectric layer on the electrostatic gripper will begin to fail due to the high temperature, thereby adversely affecting the conductivity of the dielectric layer . Increasing the conductivity of the dielectric layer limits the ability of the electrostatic chuck to generate a high electric field sufficient to grip and hold the workpiece in a fixed position relative to its support surface.

[0019] Accordingly, the present invention generally relates to an electrostatic chuck that provides improved clamping at elevated temperatures (eg, on the order of 600°C to 1000°C) by providing the electrostatic clamp with a mechanical auxiliary clamping mechanism. Accordingly, the present invention will now be described with reference to the drawings, wherein like reference numerals may be used t...

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PUM

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Abstract

The present invention provides an electrostatic chuck having a clamping plate, wherein the clamping surface of the clamping plate is configured to contact a workpiece. A voltage applied to the one or more electrodes selectively electrostatically attracts the workpiece to the clamping surface. The present invention also provides one or more auxiliary clamping members, wherein the one or more auxiliary clamping members are configured to selectively secure at least a portion of a workpiece to a clamping surface. The present invention also provides a temperature monitoring device configured to determine the temperature of the workpiece and a controller configured to control the voltage applied to one or more electrodes and one or more electrodes based at least in part on the temperature of the workpiece. A plurality of auxiliary clamping members are used to selectively clamp the workpiece to the clamping surface.

Description

[0001] Cross References to Related Applications [0002] This application claims priority and benefit to U.S. Provisional Application No. 61 / 352,554, filed June 8, 2010, entitled "HEATEDELECTROSTATICCHUCKINCLUDINGMECHANICALCLAMPCAPABILITYATHIGHTEMPERATURE," filed June 8, 2010; Priority and Benefit of Provisional Application No. 61 / 352,665, entitled Chuck "HEATED ANNULUSCHUCK," which application is hereby incorporated by reference as fully set forth herein. technical field [0003] The present invention relates generally to semiconductor processing equipment, including but not limited to ion implantation systems, and more particularly to an electrostatic chuck with mechanical clamping capabilities for use in certain ion implantation applications. Background technique [0004] Electrostatic clamps or collets (ESC) are commonly used in the semiconductor manufacturing industry to clamp workpieces or substrates during plasma-based or vacuum-based semiconductor processes (e.g., io...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/683H01L21/687
CPCH01L21/6831H01L21/68728H01L21/683H01L21/687
Inventor 佩里·J·I·加斯特阿伦·D·韦威廉·戴维斯·李阿施文·普鲁黑特加里·M·库克罗伯特·拉特梅尔
Owner AXCELIS TECHNOLOGIES