Non-alkali glass, and process for production of non-lkali glass
A technology of alkali-free glass and manufacturing method, which can be used in instruments, optics, optical components, etc., and can solve problems such as strain point reduction
Active Publication Date: 2013-09-04
ASAHI GLASS CO LTD
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However, B 2 o 3 There is a tendency to lower the strain point
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[0097] The raw materials of each component are prepared so as to have the target composition, and are melted at a temperature of 1500 to 1600° C. using a platinum crucible. While melting, the glass was homogenized by stirring using a platinum stirrer. Next, the molten glass is flowed out, formed into a plate shape, and then annealed.
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Abstract
The present invention relates to a non-alkali glass which has a strain point of 735 DEG C or higher, an average thermal expansion coefficient of 3010-7 to 4010-7 / DEG C at 50 to 350 DEG C, a temperature (T2) at which the viscosity of the glass becomes 102 dPas of 1710 DEG C or lower, a temperature (T4) at which the viscosity of the glass becomes 104 dPas of 1340 DEG C or lower, and a devitrification temperature of 1330 DEG C or lower, and comprises, in mol% in terms of oxide contents, 66 to 69 of SiO2, 12 to 15 of Al2O3, 0 to 1.5 of B2O3, 6 to 9.5 of MgO, 7 to 9 of CaO, 0.5 to 3 of SrO, 0 to 1 of BaO and 0 to 2 of ZrO2, wherein MgO+CaO+SrO+BaO = 16 to 18.2, MgO / (MgO+CaO+SrO+BaO) = 0.35 or more, MgO / (MgO+CaO) = 0.40 or more and less than 0.52, and MgO / (MgO+SrO) = 0.45 or more.
Description
technical field [0001] The present invention relates to an alkali-free glass which is suitable as various substrate glasses for displays and substrate glasses for photomasks, does not substantially contain alkali metal oxides, and is capable of float forming. Background technique [0002] Conventionally, various substrate glasses for displays, especially substrate glasses on which a metal or oxide thin film or the like has been formed on the surface, have required the following characteristics. [0003] (1) When an alkali metal oxide is contained, the alkali metal ions diffuse into the thin film to degrade the film properties, so the alkali metal ion should not be substantially contained. [0004] (2) When exposed to high temperature in the thin film forming process, in order to minimize the deformation of the glass and the shrinkage (thermal shrinkage) accompanying the structural stabilization of the glass, the strain point needs to be high. [0005] (3) To have sufficient...
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IPC IPC(8): C03C3/087C03C1/00C03C3/091C03C3/093G02B1/00G02F1/1333
CPCC03C3/087C03C3/091C03C1/00C03C3/093G02B1/00G02F1/1333
Inventor 辻村知之西泽学小池章夫
Owner ASAHI GLASS CO LTD
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