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One-dimensional magnetic photonic crystal for implementing optical isolation

A photonic crystal and optical isolation technology, applied in optics, nonlinear optics, instruments, etc., can solve the problems of difficult preparation and many thin film layers, and achieve the goal of improving integration, broadening spectral response, and reducing the total number of layers. Effect

Active Publication Date: 2013-12-25
TAIYUAN UNIV OF TECH
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Problems solved by technology

Although these structures can be used to achieve optical isolation in a small range near the central wavelength, they are difficult to prepare in practical applications due to the large number of film layers.

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  • One-dimensional magnetic photonic crystal for implementing optical isolation
  • One-dimensional magnetic photonic crystal for implementing optical isolation
  • One-dimensional magnetic photonic crystal for implementing optical isolation

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Embodiment Construction

[0023] The technical scheme of a one-dimensional magneto-photonic crystal realizing optical isolation provided by the present invention will be further described below through specific implementation methods.

[0024] A one-dimensional magneto-photonic crystal realizing optical isolation provided by the present invention has a central working wavelength of 1550nm.

[0025] Such as figure 1 As shown, a one-dimensional magneto-photonic crystal that realizes optical isolation includes a one-dimensional magneto-photonic crystal, and its composition is that the structural formula of the above-described one-dimensional magneto-photonic crystal is:

[0026] [H / L] 3 / M / [L / H] 7 / M / [H / L] 7 / M / [L / H] 3 .

[0027] Among them: H is gallium arsenide GaAs with a thickness of 114.85nm and a refractive index of 3.374; L is silicon dioxide SiO with a thickness of 259.20nm and a refractive index of 1.495 2 ; M is the thickness of 158.68nm, ε in the dielectric tensor 1 =4.884;ε 2 =0.009 c...

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Abstract

The invention relates to a one-dimensional magnetic photonic crystal for implementing optical isolation, of which the structural formula is [H / L]3 / M / [L / H]7 / M / [H / L]7 / M / [L / H]3, wherein H is a gallium arsenide film with the thickness of 114.85nm, L is a silicon dioxide film with the thickness of 259.2nm, and M is a cerium-doped yttrium iron garnet film with the thickness of 158.68nm. The crystal in such a structure can implement optical isolation within the small range near the central operating wavelength 1550nm, and only comprises 43 optical film layers, thereby lowering the actual preparation difficulty.

Description

technical field [0001] The invention relates to an optical isolator, in particular to a one-dimensional magneto-photonic crystal for realizing an integrated optical isolator. Background technique [0002] An optical isolator is a non-reciprocal passive device that only allows forward-transmitted light to pass through. Its main function is to prevent reverse-transmitted light from adversely affecting the light source and improve the stability of optical system transmission. [0003] The existing optical isolator is 45 from the direction of the optical axis o It consists of a pair of polarizers and a Faraday rotator placed between the two polarizers. The Faraday rotator includes a central magneto-optic crystal and a ring-shaped permanent magnet surrounding the magneto-optic crystal. [0004] The rapid development of modern optical communication technology requires the miniaturization of devices used in optical circuits for easy integration. However, due to the limitation of...

Claims

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Application Information

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IPC IPC(8): G02F1/09
Inventor 费宏明武建加杨毅彪陈智辉薛海斌李琳
Owner TAIYUAN UNIV OF TECH
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