Unlock instant, AI-driven research and patent intelligence for your innovation.

Glass substrate integrated cleaning device applied to OGS secondary strengthening technology

A technology for glass substrates and cleaning equipment, which is applied to liquid cleaning methods, lighting and heating equipment, and cleaning of flexible objects. It can solve problems such as reduced work efficiency, unfavorable staff safety, and high toxicity of hydrofluoric acid. Effects of improving airtightness, reducing injuries, and reducing production costs

Active Publication Date: 2015-06-10
SUZHOU KZONE EQUIP TECH
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The existing OGS secondary strengthening process cleaning equipment is an independent device. When the glass substrate is transferred between them for flow operation, it is necessary to use auxiliary devices such as manipulators, which are easy to break the glass substrate and reduce work efficiency; and hydrogen Fluoric acid is highly toxic, and it will reduce the sealing performance of the cleaning equipment when using the manipulator, which is not conducive to the safety of the staff

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Glass substrate integrated cleaning device applied to OGS secondary strengthening technology
  • Glass substrate integrated cleaning device applied to OGS secondary strengthening technology
  • Glass substrate integrated cleaning device applied to OGS secondary strengthening technology

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0022] The preferred embodiments of the present invention will be described in detail below with reference to the accompanying drawings.

[0023] Such as figure 1 The glass substrate integrated cleaning equipment for the OGS secondary strengthening process shown includes a feeding mechanism 1, a hydrofluoric pickling mechanism 2, an alkali cleaning mechanism 3, a water washing mechanism 4, a drying mechanism 5, The discharging mechanism 6, wherein the feeding mechanism 1 is used for inputting the glass substrate into the cleaning equipment, the hydrofluoric pickling mechanism 2 is used for soaking the glass substrate in hydrofluoric acid, and the alkali cleaning mechanism 3 is used for cleaning the glass substrate. Alkali soaking, the washing mechanism 4 is used to spray and wash the glass substrate, the drying mechanism 5 is used to dry the water attached to the glass substrate, and the discharge mechanism 6 is used to dry the glass substrate after the secondary strengthening...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a glass substrate integrated cleaning device applied to an OGS secondary strengthening technology. The glass substrate integrated cleaning device applied to the OGS secondary strengthening technology comprises a material feeding mechanism used for inputting glass substrates to the cleaning device, a hydrofluoric acid washing mechanism used for carrying out hydrofluoric acid steeping on the glass substrates, an alkali washing mechanism used for carrying out alkali liquid steeping on the glass substrates, a water washing mechanism used for carrying out spraying water washing on the glass substrates, a blow-dry mechanism used for drying the glass substrates in a blowing mode and a material discharging mechanism used for outputting the glass substrates, wherein the material feeding mechanism, the hydrofluoric acid washing mechanism, the alkali washing mechanism, the water washing mechanism, the blow-dry mechanism and the material discharging mechanism are connected in sequence. According to the glass substrate integrated cleaning device applied to the OGS secondary strengthening technology, the hydrofluoric acid washing mechanism, the alkali washing mechanism, the water washing mechanism, the blow-dry mechanism and the like are connected in sequence and form a whole, the leakproofness of the cleaning device can be improved, harm to workers by the hydrofluoric acid can be reduced, a mechanical arm and other extra auxiliary equipment are not needed, the risk of flat breaking of the glass substrates is reduced, production cost is reduced, and the device is suitable for large-scale popularization and utilization.

Description

technical field [0001] The invention relates to glass substrate cleaning equipment, in particular to an integrated cleaning equipment for glass substrates used in the OGS secondary strengthening process. Background technique [0002] With the continuous development of technology, OGS (One Glass Solution, that is, integrated touch) has gradually become the leading technology direction of the touch industry. It has (1) saved the cost of a layer of glass and reduced the cost of a bonding, (2) ) reduce the weight, (3) increase the light transmittance and other advantages, so it can better meet the needs of ultra-thin smart terminals and improve the display effect. [0003] The OGS secondary strengthening process can generally be divided into two types: physical method and chemical method. For the physical method, the crack repair on the end surface of the glass after cutting is a process of secondary strengthening by grinding. The advantage is that the yield rate is high and th...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): B08B11/04
CPCB08B3/022B08B3/041B08B3/08B08B11/04F26B15/12F26B21/00
Inventor 蒋新郑晔屠金玲
Owner SUZHOU KZONE EQUIP TECH