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Dual single sided sputter chambers with sustaining heater

A heater and sputtering technology, which is applied in sputtering coating coating, magnetic layer coating, disc carrier manufacturing, etc. It can solve the problems affecting the sputtering film characteristics and the temperature drop of the disk.

Inactive Publication Date: 2014-02-19
WD MEDIA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although the sputter chamber 120 provides heating during sputtering, the temperature of the disk continues to drop during the deposition process
Temperature drop can lead to different sputtered film properties that negatively affect dielectric properties

Method used

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  • Dual single sided sputter chambers with sustaining heater
  • Dual single sided sputter chambers with sustaining heater
  • Dual single sided sputter chambers with sustaining heater

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Embodiment Construction

[0015] The embodiments of the method are described herein with reference to the drawings. However, specific embodiments may be practiced without one or more specific details or in combination with other known methods, materials, and devices. In the following description, many specific details for providing a thorough understanding are explained, such as specific materials, dimensions, and processing parameters. In other cases, in order to avoid unnecessarily obscuring the subject of the requirements, well-known manufacturing processes and equipment have not been described in detail. The "one embodiment" in this specification means that a specific feature, structure, material, or characteristic described in conjunction with the embodiment is included in at least one embodiment of the present invention. Therefore, the term "in one embodiment" in different places in this specification does not necessarily refer to the same embodiment. Moreover, specific features, structures, mat...

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Abstract

A disk processing system having a heater chamber and dual single-sided sputter chambers each with a sustaining heater.

Description

Technical field [0001] The embodiments described herein relate to the field of disk processing systems, and specifically to disk processing systems, heater chambers, and dual single-sided sputtering chambers with maintenance heaters. Background technique [0002] In order to achieve an increase in the areal density of hard disk drive media, EMAR Energy Assisted Magnetic Recording (EAMR) is a next-generation media being developed after the current perpendicular magnetic recording (PMR) media. In EAMR, the recording medium is locally heated, thereby reducing the coercivity of the magnetic material during the writing operation. Then quickly cool down the local area to retain the written information. This allows the use of magnetic write heads with high-coercivity magnetic materials. The heating of the local area can be achieved by, for example, heat or a heat source, such as a laser. [0003] In order to produce good quality EMAR media, high temperature treatment is required. In t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G11B5/851
CPCG11B5/851
Inventor C·B·易H·刘H·元T·塔娜卡
Owner WD MEDIA