A substrate cleaning device
A technology for cleaning equipment and substrates. It is used in cleaning flexible items, cleaning methods and utensils, and semiconductor/solid-state device testing/measurement. , to avoid missed detection, reduce damage to vacuum equipment, and improve the detection rate
Active Publication Date: 2015-12-09
HEFEI BOE OPTOELECTRONICS TECH +1
View PDF9 Cites 0 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
[0003] In the prior art, vacuum adsorption is usually used to detect whether the glass substrate is broken. However, there are many blind spots when the vacuum adsorption method detects the glass substrate, and the cracks in the glass substrate cannot be detected, which is easy to damage the glass substrate. Occurrence of missed detection
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Embodiment Construction
[0028] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0029] Please refer to Figure 1 to Figure 3 ,in, figure 1 Schematic diagram of the structure of the substrate cleaning equipment provided by the embodiment of the present invention; figure 2 A schematic cross-sectional view of the cleaning head body in the substrate cleaning equipment provided by the embodiment of the present invention; image 3 The schematic diagram of the detection of the surface of the glass substrate by the laser displacement sensor in...
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More PUM
Login to View More Abstract
The invention discloses substrate cleaning equipment which comprises a frame, a carrying platform for carrying a glass substrate, a cleaning head body with an ultrasonic transmitter, at least one laser displacement sensor and a signal processor. The carrying platform is fixed on the frame. The cleaning head body is located above the carrying platform and slidably mounted on the frame. The laser displacement sensor is mounted on the cleaning head body and transmits laser detection rays by the aid of the surface of the glass substrate to measure the distance information between the laser displacement sensor and the surface of the glass substrate. The signal processor is in signal connection with the laser displacement sensor and used for judging damage of the glass substrate when the distance information between the laser displacement sensor and the surface of the glass substrate is abnormal. The substrate cleaning equipment has the advantages that whether damage exists on the glass substrate or not can be detected accurately, detection missing can be avoided, and the detection rate of the damaged glass substrate is increased.
Description
technical field [0001] The invention relates to the field of liquid crystal display device manufacturing equipment, in particular to substrate cleaning equipment. Background technique [0002] In the field of semiconductor and liquid crystal display, vacuum equipment is very important production equipment. Vacuum equipment is extremely difficult to maintain, especially when the vacuum equipment is abnormally shut down, it is necessary to open the cavity to overhaul its interior. However, the vacuum equipment generally needs several hours of cooling and other special treatments before opening the cavity After the overhaul is completed and assembled, it needs to be heated up and vacuumed for up to 7 to 8 hours. After the vacuum is completed, it needs to be restored for 3 to 4 hours before normal production can resume. This is a serious problem. Affects the utilization rate of the equipment. Therefore, before each glass substrate is sent into the vacuum equipment, it is neces...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline
Login to View More Patent Type & Authority Patents(China)
IPC IPC(8): B08B11/04H01L21/66
CPCB08B11/04
Inventor 刘建辉丁欣陈甫张亮袁涛刘祖宏吴代吾侯智
Owner HEFEI BOE OPTOELECTRONICS TECH