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Nanoimprinting apparatus, nanoimprinting method, distortion imparting device and distortion imparting method

A technology of nanoimprinting and devices, which is applied in nanotechnology, nanotechnology, semiconductor/solid-state device manufacturing, etc., and can solve the problem that imprinted components cannot be fully deformed

Inactive Publication Date: 2014-06-04
FUJIFILM CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0013] However, the methods disclosed in Patent Documents 1 and 2 have a problem that the imprint member cannot be sufficiently deformed in the case where its rigidity is high

Method used

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  • Nanoimprinting apparatus, nanoimprinting method, distortion imparting device and distortion imparting method
  • Nanoimprinting apparatus, nanoimprinting method, distortion imparting device and distortion imparting method
  • Nanoimprinting apparatus, nanoimprinting method, distortion imparting device and distortion imparting method

Examples

Experimental program
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Effect test

Embodiment 1

[0169] (manufacturing of models)

[0170] First, a 0.725 mm thick Si substrate was coated with a resist liquid having a PHS (polyhydroxystyrene)-based chemically amplified resist as a main component by spin coating to form a resist layer. Thereafter, while scanning the Si substrate on the XY stage, an electron beam modulated according to a line pattern having a line width of 30 nm and a pitch of 60 nm was irradiated onto the resist layer so as to spread over the entire 0.5 nm of the resist layer. Expose linear concave-convex patterns on the range of mm square.

[0171] Thereafter, the photoresist layer is developed and the exposed parts are removed. Finally, selective etching was performed to a depth of 60 nm by RIE using the resist layer from which the exposed portion had been removed as a mask, to obtain a Si model having a linear concave-convex pattern.

[0172] (substrate for imprinting)

[0173] A quartz substrate is used as the substrate. The surface of the quartz su...

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Abstract

In nanoimprinting, contact between a pattern of protrusions and recesses of a mold and resist being initiated at the center thereof is enabled utilizing any imprinting member regardless of the rigidity of the imprinting member. A nanoimprinting apparatus (10) is equipped with: a distortion imparting device (20) that applies external force onto an imprinting member (1) to maintain the imprinting member (1) in a predetermined flexed state, thereby imparting permanent distortion to the imprinting member (1); and an imprinting unit (40) that utilizes the imprinting member (1) having the permanent distortion imparted thereto and presses a pattern (2) of protrusions and recesses of a mold (1) onto resist (7) provided on a substrate (6), to transfer the pattern (2) of protrusions and recesses to the resist (7).

Description

technical field [0001] The present invention relates to a nanoimprint device for performing a nanoimprint operation using a model having a predetermined concavo-convex pattern on its surface, and a nanoimprint method using the nanoimprint device. The present invention also relates to a deformation imparting device and a deformation imparting method employed in a nanoimprint apparatus and a nanoimprint method. Background technique [0002] Nanoimprinting is a development of embossing technology, which is well known in the production of optical discs. In the nanoimprint method, a mold on which a concave-convex pattern is formed (generally referred to as a mold, a stamper, or a template) is pressed against a resist coated on a substrate, which is an object to be processed. The pressing of the original on the resist causes mechanical deformation or flow of the resist to precisely transfer the fine pattern. If the model is fabricated at one time, nanoscale fine structures can b...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/027B29C59/02
CPCG03F7/0002B29C59/02B82Y10/00B82Y40/00H01L21/0273
Inventor 若松哲史服部昭子
Owner FUJIFILM CORP