Chemico-mechanical polishing solution of computer disc
A technology of chemical mechanics and polishing fluid, which is applied in the computer field, can solve problems not related to removal rate and surface roughness, reduce hard disk surface roughness, etc., and achieve the goal of improving surface quality and processing efficiency, reducing difficulty, and high polishing rate Effect
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Embodiment 1
[0024] 1. Experimental equipment and reagents
[0025] 1) Instrument: CMP tester (CETR CP-4)
[0026] 2) The composition of computer hard disk chemical mechanical polishing fluid is as follows:
[0027] Abrasive particles: SiO with a radius of 10nm 2 5wt%;
[0028] Oxidant: hydrogen peroxide 2wt%;
[0029] Sodium polyacrylate 1wt%;
[0030] 0.1M hydrochloric acid was used to adjust the pH of the polishing solution to 3.0, and the solvent was deionized water.
[0031] 2. Detection method - hard disk 3.5-inch disc polishing test method
[0032] Condition: Pressure (Down Force): 5psi
[0033] Polishing pad speed (Pad Speed): 150rpm
[0034] Polishing head speed (Carrier Speed): 150rpm
[0035] Temperature: 25°C
[0036] Polishing liquid flow rate (Feed Rate): 150ml / min
[0037] Using the computer hard disk chemical mechanical polishing liquid prepared in this example as the polishing liquid, the hard disk is polished by the CP-4 polishing machine of CETR Company of ...
Embodiment 2
[0041] 1. Experimental equipment and reagents
[0042] 1) Instrument: CMP tester (CETR CP-4)
[0043] 2) The composition of computer hard disk chemical mechanical polishing fluid is as follows:
[0044] Abrasive particles: SiO with a radius of 50nm 2 1wt%;
[0045] Oxidant: Potassium ferricyanide 10wt%;
[0046] Sodium polyoxyethylene sulfate 0.5wt%;
[0047] 2M hydrochloric acid was used to adjust the pH of the polishing solution to 3.0, and the solvent was deionized water.
[0048] 2. Detection method - hard disk 3.5-inch disc polishing test method
[0049] Condition: Pressure (Down Force): 5psi
[0050] Polishing pad speed (Pad Speed): 150rpm
[0051] Polishing head speed (Carrier Speed): 150rpm
[0052] Temperature: 25°C
[0053] Polishing liquid flow rate (Feed Rate): 150ml / min
[0054]Using the computer hard disk chemical mechanical polishing liquid prepared in this example as the polishing liquid, the hard disk is polished by the CP-4 polishing machine of ...
Embodiment 3
[0058] 1. Experimental equipment and reagents
[0059] 1) Instrument: CMP tester (CETR CP-4)
[0060] 2) The composition of computer hard disk chemical mechanical polishing fluid is as follows:
[0061] Abrasive particles: SiO with a radius of 80nm 2 10wt%;
[0062] Oxidant: ammonium persulfate 2wt%;
[0063] Sodium polyoxyethylene ether phosphate 1.5wt%;
[0064] 0.1M hydrochloric acid was used to adjust the pH value of the polishing solution to 1.0, and the solvent was deionized water.
[0065] 2. Detection method - hard disk 3.5-inch disc polishing test method
[0066] Condition: Pressure (Down Force): 5psi
[0067] Polishing pad speed (Pad Speed): 150rpm
[0068] Polishing head speed (Carrier Speed): 150rpm
[0069] Temperature: 25°C
[0070] Polishing liquid flow rate (Feed Rate): 150ml / min
[0071] Using the computer hard disk chemical mechanical polishing liquid prepared in this example as the polishing liquid, the hard disk is polished by the CP-4 polishi...
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