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Photoresist nozzle device and photoresist supply system

A nozzle device and photoresist technology, which is applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., can solve problems such as inconsistent images

Inactive Publication Date: 2015-06-24
TAIWAN SEMICON MFG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Now the patterns have very fine detail and some issues in the photoresist can lead to non-conforming images in the exposed photoresist
Although existing devices and methods for lithographic processes are often adequate for their intended purposes, they are not fully compliant in all respects

Method used

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  • Photoresist nozzle device and photoresist supply system
  • Photoresist nozzle device and photoresist supply system
  • Photoresist nozzle device and photoresist supply system

Examples

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Embodiment Construction

[0030] The making and using of various embodiments of the invention are discussed in detail below. It should be understood, however, that the various embodiments may be practiced in a wide variety of specific contexts. The specific embodiments discussed are for purposes of illustration only, and do not limit the scope of the invention.

[0031] It should be understood that the following disclosure provides many different embodiments or examples for implementing different features of the invention. Specific examples of components and arrangements are described below to simplify the present disclosure. Of course, these are examples only and are not intended to limit the invention. Also, in the following description, performing the first process before the second process may include an embodiment in which the second process is performed immediately after the first process, and may also include performing an additional process between the first process and the second process. t...

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Abstract

Embodiments of a photoresist supply system including a photoresist nozzle device are provided. The photoresist nozzle device includes a tube including a first segment, a curved segment connected to the first segment, and a second segment connected to the curved segment. The photoresist nozzle device also includes a nozzle connected to the second segment.

Description

technical field [0001] The invention relates to the technical field of semiconductors, and more specifically, to a photoresist nozzle device and a photoresist supply system. Background technique [0002] Semiconductor devices are used in a variety of electronic applications, such as personal computers, cell phones, digital cameras, and other electronic equipment. Generally, semiconductor devices are fabricated by sequentially depositing an insulating or dielectric layer, a conductive material layer, and a semiconducting material layer over a semiconductor substrate, and patterning the various material layers using photolithography to form circuit components and elements thereon. Many integrated circuits are typically fabricated on a single semiconductor wafer, and the individual dies on the wafer are separated by dicing between the integrated circuits along scribe lines. For example, the individual dies are typically individually packaged in multi-chip modules or other type...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/16
CPCH01L21/6715
Inventor 曾国书陈有峰陈彦羽
Owner TAIWAN SEMICON MFG CO LTD