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A mask table for improving the vertical gravity bending of the mask

A mask table and mask technology, which is applied in the directions of photolithography exposure devices, microlithography exposure equipment, etc.

Active Publication Date: 2017-08-29
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

But this method has its limitations. Using the same compensation for different masks, the compensation effect may not be very good, so the best way is to fundamentally eliminate the deformation of the mask through hardware transformation.

Method used

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  • A mask table for improving the vertical gravity bending of the mask
  • A mask table for improving the vertical gravity bending of the mask
  • A mask table for improving the vertical gravity bending of the mask

Examples

Experimental program
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Embodiment Construction

[0019] Specific embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0020] Figure 4 It is a structural schematic diagram of the first embodiment of the mask table for improving the vertical gravity bending of the mask in the present invention. It can be seen that this solution is based on the original mask, and a set is added at the symmetrical positions on the left and right sides of the mask table. For the vacuum adsorption system 7 with external adsorption force, each set of vacuum adsorption system may include several adsorption units. In this example, a set of adsorption system includes one adsorption unit as an example for illustration. The bottom of the adsorption system 7 is connected with a guide rail 6, and can move left and right on the guide rail 6 under the drive of the motor. The dotted arrow in the figure indicates the direction in which the mask is sent into the mask table by the transfer rob...

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Abstract

A mask bench capable of improving vertical gravity bending of a mask is provided. The mask bench is characterized in that: the mask bench comprises systems applying symmetric outward tension forces depart from the mask direction to the mask. Based on original mask benches, the systems which can apply symmetric outward tension forces to two side edges or the periphery edge of the mask, such as vacuum adsorption systems, are additionally arranged, so that symmetric outward tension forces are generated onto the mask from the direction of quartz surface edges of the mask. The outward tension forces can improve downward bending deformation caused by gravity of the mask.

Description

technical field [0001] The invention relates to the technical field of semiconductor manufacturing equipment, in particular to a mask stage for a photolithography machine that improves vertical gravity bending of a mask. Background technique [0002] With the development of TFT-LCD technology, in order to reduce manufacturing costs, the size of Glass has been increasing, and has now developed into the mainstream 8.5-generation (glass size 2200mm×2500mm) large-generation production line, and Japan’s Sharp even introduced a 10-generation line ( The glass size is 2800mm×3000mm). At the same time, to manufacture TFT patterns, the size of the mask used in lithography is also increasing with the increase of generations. Taking the mask size used by Nikon lithography machine as an example, the size of the 8.5 generation mask has reached 1400mm (length) × 1220mm (width) × 13mm (thickness). Such a large mask placed on the mask table will inevitably be affected by the downward gravi...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
Inventor 孟春霞闻人青青李玉龙林彬张俊
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD