Wide-spectrum omnidirectional photovoltaic glass antireflection film and its preparation method and use
A technology of anti-reflection film and products, which is applied in the direction of glass/slag layered products, chemical instruments and methods, layered products, etc., which can solve the influence of module output power, loss of anti-reflection and anti-reflection effects, and single control means of anti-reflection characteristics And other issues
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[0072] In a preferred example, the preparation method of the broadband omnidirectional anti-reflection film of the present invention comprises the following steps:
[0073] 1. Preparation of nano-silica sol, the raw materials used include deionized water, catalyst, silica sol, silicon source and solvent; the particle size range of the silica sol used is 10nm-50nm;
[0074] 2. Prepare nano-silica-PS emulsion mixed sol, add nano-silica sol obtained in step (1) to PS microsphere emulsion, mix and stir to obtain nano-silica-PS emulsion mixed sol, the particle size of PS microsphere emulsion The diameter is 200nm-500nm;
[0075] 3. Coating film, coating the nano-silica-PS emulsion mixed sol obtained in step (2) on the photovoltaic glass, the film thickness is controlled in the range of 100-200nm,
[0076] 4. Curing treatment, the photovoltaic glass is cured at a temperature of 500-730°C for 2 to 20 minutes, and the PS microspheres embedded in the porous silicon oxide film on the s...
Embodiment 1
[0083] Mix 0.25mol of water, 0.05mol of concentrated hydrochloric acid, 20g of silica sol (particle size 10nm, concentration 30%) and 5mol of absolute ethanol, stir and heat, and when the temperature reaches the set temperature of 40°C, add 0.05mol of ethyl orthosilicate (TEOS), keep the temperature constant, and keep stirring for 30 hours to obtain a stable and transparent nano-silica sol;
[0084] Slowly add 2g of PS microsphere emulsion with a particle size of 200nm (concentration: 5%) into the above-mentioned nano-silica sol, and keep stirring for 15 minutes; then slowly add 2g of PS microsphere emulsion with a particle size of 500nm (concentration: 5%), and keep stirring After 15 minutes, a nano-silica-PS emulsion mixed sol was obtained, which was ready for use.
[0085] Coat the nano-silica-PS emulsion mixed sol on a photovoltaic glass sample with a thickness of 3.2 mm by the pulling method at a pulling speed of 1 mm / s, and dry naturally after pulling to obtain a transpa...
Embodiment 2
[0093] Mix 0.25mol of water, 0.05mol of concentrated hydrochloric acid, 20g of silica sol (particle size 25nm, concentration 30%) and 5mol of absolute ethanol, stir and heat, and when the temperature reaches the set temperature of 40°C, add 0.05mol of ethyl orthosilicate (TEOS), keep the temperature constant, and keep stirring for 30 hours to obtain a stable and transparent nano-silica sol;
[0094] Slowly add 1g of PS microsphere emulsion with a particle size of 200nm (concentration: 5%) into the above-mentioned nano-silica sol, and keep stirring for 15 minutes; then slowly add 3g of PS microsphere emulsion with a particle size of 400nm (concentration: 5%), and keep stirring After 15 minutes, a nano-silica-PS emulsion mixed sol was obtained, which was ready for use.
[0095] The nano-silica-PS emulsion mixed sol was coated on the photovoltaic glass sample with a thickness of 3.2 mm by spin coating, the spin coating speed was 1000 rpm, and the spin coating time was 15 seconds....
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