A photovoltaic glass anti-reflection film

Abstract

The invention discloses a photovoltaic glass antireflection film, which comprises a glass substrate and an antireflection film compounded on the surface of the glass substrate. The glass substrate is embossed glass or ultra-white low-iron glass, and the antireflection film is made by physical vapor deposition. multilayer film, the multilayer film is laminated on the surface of the glass substrate from the inside to the outside, in which the first layer is Al 2 o 3 coating, the second layer is SiO 2 coating, the third layer is Al 2 o 3 coating, the fourth layer is TiO 2 coating, the fifth layer is SiO 2 coating, the sixth layer is TiO 2 coating, the seventh layer is SiO 2 Coating; the photovoltaic glass anti-reflection coating does not significantly increase the length of the physical vapor deposition coating production line and the cost of materials and production. It has an anti-reflection effect in the wavelength range of 300-1200 nanometers. The average transmittance is higher than 94%; under the condition of vertical incidence, the color neutrality is good, and the anti-reflection coating is closer to the original color of ultra-white glass than the chemical coating, and it has good compatibility with the subsequent glass tempering process.

Description

technical field [0001] The invention belongs to the technical field of anti-reflection film and its preparation, and in particular relates to an anti-reflection film for photovoltaic glass. Background technique [0002] Photovoltaic glass anti-reflection film not only needs to have high optical transmittance, but also needs to have excellent mechanical properties and weather resistance. At present, the sol-gel method is widely used to prepare SiO with certain porosity by roller coating, pulling, spin coating or spray coating. 2 AR coating. Usually, the refractive index of this kind of anti-reflection film prepared by chemical wet method is relatively close to the ideal refractive index of 1.23 of a single-layer anti-reflection film in the visible light and near-infrared bands (about 300-1200 nm wavelength range), so it can be used in this band. Obtain a higher solar spectrum weighted average transmittance. Although, various SiO 2 Nanoparticles (solid, mesoporous, core-sh...

AI Technical Summary

Problems solved by technology

Compared with the photovoltaic glass chemical coating technology currently used in the industry, the adoption of physical vapor deposition technology will undoubtedly further improve the strength and reliability of photovoltaic anti-reflection coatings, and obtain better color neutrality, but for the current anti-reflection coatings of physical vapor deposition Due to the problem of narrow spectrum, it is urgent to invent a multi-layer film structure with good color neutrality and broadband anti-reflection characteristics at 300-1200 nanometers, while ensuring that the length of the physical vapor deposition coating production line does not increase significantly and ensures that the coating material is compatible with tempered glass. Process Compatibility and Matching

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