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A flexible water-oxygen barrier film with broadband anti-reflection effect and preparation method thereof

A technology of water-oxygen barrier film and barrier film, which is applied in the direction of semiconductor/solid-state device parts, semiconductor devices, electrical components, etc., can solve the problem of low water-oxygen barrier performance, difficulty in meeting the requirements of optoelectronic devices, and optical performance that cannot meet the requirements of flexibility and transparency Optoelectronic device use requirements and other issues, to achieve the effect of low cost, good bending performance, high efficiency

Active Publication Date: 2019-09-13
HUAZHONG UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, due to its inherent loose and porous surface, polymer films have low water and oxygen barrier performance, which is difficult to meet the requirements of optoelectronic devices. On the other hand, most of the existing barrier film structures only consider barrier properties when designing and manufacturing and bending properties, its optical properties cannot meet the needs of flexible and transparent optoelectronic devices
Therefore, the prior art lacks a water-oxygen barrier film that has barrier properties and meets optical performance requirements and its preparation method for flexible transparent optoelectronic devices.

Method used

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  • A flexible water-oxygen barrier film with broadband anti-reflection effect and preparation method thereof
  • A flexible water-oxygen barrier film with broadband anti-reflection effect and preparation method thereof
  • A flexible water-oxygen barrier film with broadband anti-reflection effect and preparation method thereof

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preparation example Construction

[0034] Specifically, the preparation method comprises the following steps:

[0035] (1) Select the film material type and film deposition process of the flexible transparent substrate, the barrier film, so that the glass transition temperature of the flexible transparent substrate is higher than the working temperature of the film deposition process, and the film material of the barrier film is at least Two different materials are selected, and the refractive index of the flexible transparent substrate is between the highest refractive index and the lowest refractive index of the film materials selected for the barrier film.

[0036] Specifically, the selection principles of the flexible transparent substrate and the thin film deposition process include the following aspects: at least two different materials are selected for the barrier film material, and the refractive index of the substrate material should be within the range of the selected film material (that is, each layer...

Embodiment 1

[0053] Example 1 is to deposit silicon nitride / silicon oxide alternating structure by PECVD process on a transparent polyimide PI substrate with a glass transition temperature of 356 ° C. The steps adopted are as follows:

[0054] 1) Prepare a transparent polyimide PI film on a glass substrate with a thickness of 20 microns.

[0055] 2) According to the thermal properties such as the glass transition temperature and thermal expansion coefficient of the above-mentioned polyimide film, and the optical properties such as the refractive index and extinction coefficient of the selected film material, the PECVD process is selected for deposition.

[0056] Specifically, since the selected PI substrate has a glass transition temperature of 356°C, the selected film material is silicon nitride SiN x and silicon oxide SiO x (Since the atomic ratio of silicon nitride and silicon oxide deposited by different film deposition processes is not a fixed value, here silicon nitride SiN x and s...

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Abstract

The invention discloses a flexible and transparent moisture and oxygen blocking film and a fabrication method thereof. The flexible and transparent moisture and oxygen blocking film is arranged on a flexible and transparent substrate, the blocking film has a wideband anti-reflection effect and is of a multi-layer structure, the thickness of each layer in the blocking film is within a range of 10-400 nanometers, and the total layers of the blocking film are within a range of 2-20. A film mechanism of the blocking film is designed by employing a multi-layer wideband anti-reflection film design method in a thin film optical theory, the blocking film is deposited on the flexible and transparent substrate by a thin film deposition process to fabricate and obtain the flexible moisture and oxygen blocking film which is compatible with blocking performance, the bending performance and the optical performance, is low in process cost and has the wideband anti-reflection effect, and thus, the technical problem that the prior art lacks the moisture and oxygen blocking film which is applied to a flexible and transparent photoelectric device, has blocking performance and can conform to optical performance requirement is solved.

Description

technical field [0001] The invention belongs to the field of photoelectric devices, and more specifically relates to a flexible water-oxygen barrier film with broadband anti-reflection effect and a preparation method thereof. Background technique [0002] Emerging flexible and transparent optoelectronic devices, such as flexible and transparent solar cells (solar cells), organic light-emitting diodes (OLEDs), touch panels (touch panels), etc., have broad application prospects in people's lives because of their unique advantages. , and the preparation of high-performance transparent and flexible substrates is the first problem that needs to be solved to realize the flexibility and transparency of optoelectronic devices. Transparent polymer films have become the first choice for transparent flexible substrates due to their advantages such as light and thin volume, good bending performance, rich variety, and compatibility with roll-to-roll large-area mass production processes. ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L23/28H01L23/29H01L31/0216
Inventor 屠国力申九林
Owner HUAZHONG UNIV OF SCI & TECH
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