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A kind of preparation method of superhydrophobic anti-reflection coating with high light transmittance

An anti-reflection coating, high light transmittance technology, applied in the field of inorganic functional materials, can solve the problems of low average light transmittance of AR films, and achieve the effects of improving optical performance, easy operation, and resisting structure collapse.

Active Publication Date: 2021-06-22
CHANGZHOU UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The highest light transmittance of the super-hydrophobic AR film prepared by Zhang et al. is between 95% and 96%, but the average light transmittance of the AR film in the visible light range is less than 95%.

Method used

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  • A kind of preparation method of superhydrophobic anti-reflection coating with high light transmittance
  • A kind of preparation method of superhydrophobic anti-reflection coating with high light transmittance
  • A kind of preparation method of superhydrophobic anti-reflection coating with high light transmittance

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0023] (1) Weigh 0.12g of PAA and place it in a beaker, add 7.0mL of ammonia water, mix evenly with the wrist, slowly add 120mL of absolute ethanol solvent under the condition of vigorous stirring (multi-head stirrer), and transfer the beaker to 50 ℃ into a constant temperature magnetic stirrer, the first co-precursor TEOS / FAS (15:1 molar ratio) was added dropwise and stirred for 18 hours to obtain a light blue TF sol.

[0024] (2) According to n(HMDS):n(TEOS)=2:1, the second precursor HMDS was added to the TF sol, stirred at ambient temperature for 12 hours and aged for 4 days to obtain TF-H sol. Among them, Si 总 (total amount of TEOS / FAS and HMDS): PAA: EtOH: NH 3 ·H 2 The final molar ratio of O was 1:0.019:2.113:23.854.

[0025] (3) TF-H sol was deposited on the cleaned glass substrate by dipping-pulling method. The coating was cured in an oven at 100°C for 1 hour, and then calcined in a muffle furnace at 350°C for 2 hours. Finally, the average light transmittance in th...

Embodiment 2

[0027] (1) Weigh 0.12g of PAA and place it in a beaker, add 7.0mL of ammonia water, mix evenly with the wrist, slowly add 120mL of absolute ethanol solvent under the condition of vigorous stirring (multi-head stirrer), and transfer the beaker to 50 ℃ into a constant temperature magnetic stirrer, the first co-precursor TEOS / FAS (10:1 molar ratio) was added dropwise, and stirred for 14 hours to obtain a light blue TF sol.

[0028] (2) Add the second precursor HMDS to the TF sol according to n(HMDS):n(TEOS)=2:1, stir at ambient temperature for 10 h and age for 5 days to obtain TF-H sol. Among them, Si 总 (total amount of TEOS / FAS and HMDS): PAA: EtOH: NH 3 ·H 2 The final molar ratio of O was 1:0.019:2.099:23.705.

[0029] (3) TF-H sol was deposited on the cleaned glass substrate by dipping-pulling method. The coating was cured in an oven at 100°C for 1 hour, and then calcined in a muffle furnace at 350°C for 2 hours. Finally, the average light transmittance in the visible ligh...

Embodiment 3

[0031] (1) Weigh 0.12g of PAA and place it in a beaker, add 7.0mL of ammonia water, mix evenly with the wrist, slowly add 120mL of absolute ethanol solvent under the condition of vigorous stirring (multi-head stirrer), and transfer the beaker to 50 ℃ into a constant temperature magnetic stirrer, the first co-precursor TEOS / FAS (10:1 molar ratio) was added dropwise and stirred for 12 hours to obtain a light blue TF sol.

[0032] (2) Add the second precursor HMDS to the TF sol according to n(HMDS):n(TEOS)=1:1, stir at ambient temperature for 8 hours and age for 3 days to obtain TF-H sol. Among them, Si 总 (total amount of TEOS / FAS and HMDS): PAA: EtOH: NH 3 ·H 2 The final molar ratio of O was 1:0.032:3.454:39.002.

[0033](3) TF-H sol was deposited on the cleaned glass substrate by dipping-pulling method. The coating was cured in an oven at 100°C for 1 hour, and then calcined in a muffle furnace at 350°C for 2 hours. Finally, the average light transmittance in the visible lig...

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Abstract

The invention belongs to the field of inorganic functional materials. Specifically disclosed is a preparation method of a superhydrophobic anti-reflection coating with high light transmittance. The method uses tetraethyl orthosilicate (TEOS) and triethoxy-1H,1H,2H,2H-tridecafluoro-n-octylsilane (FAS) as the first co-precursor, and adopts an improved method to prepare shallow The blue TF sol was then hydrophobically modified by the second precursor HMDS to prepare TF‑H sol. TF‑H sols were deposited on cleaned glass substrates by the dip‑pull method. The coating is cured in an oven at 100°C, and then calcined in a muffle furnace at 350°C to finally obtain an average light transmittance of 97.58% in the visible light range, a water contact angle of 172.6°±2, and a water sliding angle of <2° High-transmittance super-hydrophobic anti-reflection coating.

Description

technical field [0001] The invention belongs to the field of inorganic functional materials, in particular to a preparation method of a superhydrophobic anti-reflection coating with high light transmittance. Background technique [0002] The anti-reflection film is also called anti-reflection film, that is, a layer of optical film is coated on the surface of the optical element, and the interference effect of light is used to reduce the light reflection on the surface of the optical element and increase the transmittance of light, thereby improving the light sensitivity of related devices. utilization rate. Anti-reflection (AR) films have been widely used in optical devices and energy-related applications to reduce light reflection. Optical components have been used in the natural environment for a long time, and the surface of the AR film is easily polluted, which affects the utilization of light. Therefore, it is particularly important for AR films to have self-cleaning ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C03C17/22C03C17/00C03C17/27
CPCC03C17/009C03C17/22C03C17/27
Inventor 陈若愚郝丽琴王红宁刘小华
Owner CHANGZHOU UNIV
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