Photovoltaic glass antireflection film

Abstract

The invention discloses a photovoltaic glass antireflection film. The photovoltaic glass antireflection film comprises a glass substrate and an antireflection film which is compounded on the surface of the glass substrate; the glass substrate is figured glass or ultra-white low-iron glass; the antireflection film is a multilayer film which is prepared by physical vapour deposition; the multilayerfilm is overlapped on the surface of the glass substrate in sequence from inside to outside, wherein the first layer is an Al2O3 coating layer, the second layer is a SiO2 coating layer, the third layer is an Al2O3 coating layer, the fourth layer is a TiO2 coating layer, the fifth layer is a SiO2 coating layer, the sixth layer is a TiO2 coating layer, and the seventh layer is a SiO2 coating layer;the photovoltaic glass antireflection film has a transmission increasing effect in the wavelength range of 300 to 1,200 nanometers without obviously increasing the length of a physical vapour deposition coating production line, materials and production cost; under the condition of single-sided coating, the average transmission rate is higher than 94 percent in the wavelength range of 360 to 1,200nanometers; the observed colour neutrality is good under a vertical incidence condition; compared with a chemically coated antireflection film, the photovoltaic glass antireflection film is closer tothe original colour of ultra-white glass, and has good compatibility with a subsequent glass tempering process.

Description

technical field [0001] The invention belongs to the technical field of anti-reflection film and its preparation, and in particular relates to an anti-reflection film for photovoltaic glass. Background technique [0002] Photovoltaic glass anti-reflection film not only needs to have high optical transmittance, but also needs to have excellent mechanical properties and weather resistance. At present, the sol-gel method is widely used to prepare SiO with certain porosity by roller coating, pulling, spin coating or spray coating. 2 AR coating. Usually, the refractive index of this kind of anti-reflection film prepared by chemical wet method is relatively close to the ideal refractive index of 1.23 of a single-layer anti-reflection film in the visible light and near-infrared bands (about 300-1200 nm wavelength range), so it can be used in this band. Obtain a higher solar spectrum weighted average transmittance. Although, various SiO 2 Nanoparticles (solid, mesoporous, core-sh...

AI Technical Summary

Problems solved by technology

Compared with the photovoltaic glass chemical coating technology currently used in the industry, the adoption of physical vapor deposition technology will undoubtedly further improve the strength and reliability of photovoltaic anti-reflection coatings, and obtain better color neutrality, but for the current anti-reflection coatings of physical vapor deposition Due to the problem of narrow spectrum, it is urgent to invent a multi-layer film structure with good color neutrality and broadband anti-reflection characteristics at 300-1200 nanometers, while ensuring that the length of the physical vapor deposition coating production line does not increase significantly and ensures that the coating material is compatible with tempered glass. Process Compatibility and Matching

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