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Substrate support for lithographic apparatus and lithographic apparatus

A substrate support and substrate technology, applied in microlithography exposure equipment, optomechanical equipment, optics, etc., can solve the problem of high thermal load

Inactive Publication Date: 2017-09-26
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

For example, when the airlock mechanism is above the sensor (such as a transmission image sensor TIS board), it can be seen that the thermal load is relatively high

Method used

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  • Substrate support for lithographic apparatus and lithographic apparatus
  • Substrate support for lithographic apparatus and lithographic apparatus
  • Substrate support for lithographic apparatus and lithographic apparatus

Examples

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Embodiment Construction

[0037] This specification discloses one or more embodiments that incorporate the features of this invention. These disclosed embodiments are merely exemplary of the invention. The scope of the invention is not limited to the disclosed embodiments. The invention is defined by the appended claims.

[0038] The described embodiments and references in the specification to "one embodiment," "an embodiment," "example embodiment," etc. indicate that the described embodiments may include a particular feature, structure, or characteristic, but each implementation Examples do not necessarily include specific features, structures or characteristics. Moreover, these terms are not necessarily referring to the same embodiment. In addition, when a particular feature, structure or characteristic is described in conjunction with an embodiment, it is to be understood that it is within the knowledge of those skilled in the art to implement such feature, structure or characteristic in combinat...

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PUM

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Abstract

The invention discloses a substrate support for an apparatus of the type described for projecting a beam of EUV radiation onto a target portion of a substrate (400). The substrate support includes: a substrate table configured to hold a substrate; a support block (420) for supporting the substrate table; and a cover plate (450') disposed around the substrate table. The top surface of the cover plate and the top surface of the substrate mounted on the substrate table are both substantially at the same height level. At least one sensor unit (430) is positioned on the substrate support and its top surface is also at the same height level as the top surfaces of the cover plate and the substrate. Additionally, an EUV lithographic apparatus comprising such a substrate support is disclosed.

Description

[0001] Cross References to Related Applications [0002] This application claims the benefit of U.S. Provisional Application 61 / 738,344, filed December 17, 2012, and U.S. Provisional Application 61 / 873,806, filed September 4, 2013, which are hereby incorporated by reference in their entirety . technical field [0003] The invention relates to a lithographic apparatus and a substrate support for a lithographic apparatus. Background technique [0004] A lithographic apparatus is a machine that applies a desired pattern to a substrate, usually a target portion of the substrate. For example, lithographic equipment may be used in the manufacture of integrated circuits (ICs). In this case, a patterning device, alternatively referred to as a mask or reticle, may be used to generate the circuit pattern to be formed on the individual layers of the IC. Such a pattern may be transferred onto a target portion (eg comprising a portion, one or several dies) on a substrate (eg a silicon...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCG03F7/70875G03F7/70908
Inventor E·阿勒马克A·考沃埃特斯R·拉法尔N·坦凯特C·路吉腾H-K·尼恩惠斯
Owner ASML NETHERLANDS BV