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Cryopump

A cryopump, low temperature technology, used in pumps, liquid variable capacity machinery, machines/engines, etc., can solve the problems of cryopump pressure rise, cryopump can not be fully utilized, etc., to achieve the effect of improving the occlusion limit

Active Publication Date: 2016-10-12
SUMITOMO HEAVY IND LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In this way, the gas will vaporize again at the contact point, causing the pressure inside the cryopump to rise
Afterwards, the cryopump cannot fully perform its original function of exhausting the vacuum chamber

Method used

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Embodiment Construction

[0017] Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. In addition, in the description, the same reference numerals are assigned to the same elements, and overlapping descriptions are appropriately omitted. In addition, the structures described below are examples and do not limit the scope of the present invention in any way.

[0018] First, the process and outline of one embodiment of the present invention will be described.

[0019] In a cryopump having a plurality of second cryopanels, the growth rate of the condensation layer on each second cryopanel differs depending on the location of each second cryopanel. If a certain second cryopanel is arranged near a gas inlet such as a cryopump suction port, many gases can reach the second cryopanel from the gas inlet, so the condensed layer deposited on the second cryopanel can grow rapidly. On the contrary, the condensation layer deposited on another second cryopanel...

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PUM

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Abstract

The present invention provides a cryopump which can increase a gas capacity limit of a cryopump. The cryopump (10) includes a radiation shield (30), a top cryopanel (41), and a bottom cryopanel (44). The radiation shield (30) includes a shield main slit (36) that communicates a shield outside gap (20) into a shield cavity (33). The top cryopanel (41) includes a top cryopanel outer circumferential end (41a) located axially above the shield main slit (36). The bottom cryopanel (44) includes a bottom cryopanel outer circumferential end (44a) located axially below the shield main slit (36). An annular vacant space is formed between the top cryopanel outer circumferential end (41a) and the bottom cryopanel outer circumferential end (44a) and the top cryopanel outer circumferential end (41a) is directly opposed to the bottom cryopanel outer circumferential end (44a) with the annular vacant space interposed therebetween.

Description

[0001] This application claims priority based on Japanese Patent Application Nos. 2015-073196 and 2015-073197 filed on March 31, 2015. The entire contents of this Japanese application are incorporated herein by reference. technical field [0002] The invention relates to a cryopump. Background technique [0003] A cryopump is a vacuum pump that traps gas in a cryopanel cooled to an ultra-low temperature by condensation or adsorption. In this way, the cryopump exhausts the vacuum chamber in which the cryopump is installed. [0004] A cryopump generally includes a first cryopanel cooled to a certain temperature and a second cryopanel cooled to a lower temperature than the first cryopanel. The first cryopanel includes a radiation shield. As the cryopump is used, the condensed layer of gas on the second cryopanel grows. The condensed layer eventually comes into contact with the radiation shield or a certain part of the first cryopanel. In this way, the gas is vaporized agai...

Claims

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Application Information

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IPC IPC(8): F04B37/08
CPCF04B37/08
Inventor 及川健
Owner SUMITOMO HEAVY IND LTD
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