Laser-Based Control of Surface Morphology of Nanostructured Silicon Substrates

A nanostructure and surface morphology technology, applied in the process of producing decorative surface effects, manufacturing microstructure devices, nanotechnology, etc., can solve the problem of affecting surface morphology, distortion of silicon-based surface morphology, and unsatisfactory silicon-based surface morphology and other problems, to achieve the effect of short time and high efficiency
CN106744659BActive Publication Date: 2018-09-07芜湖数字信息产业园有限公司
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
芜湖数字信息产业园有限公司
Publication Date
2018-09-07

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Abstract

The invention discloses a research method for controlling the surface morphology of nanostructured silicon based on laser: 1. Using materials with different thermal conductivity to contact the nanostructured silicon substrate; 2. Laser irradiation on the surface of the nanostructured silicon substrate; 3. Observing the silicon substrate The morphology of the substrate surface and the aspect ratio of the protrusions on the silicon substrate were measured. 4. Summarize the change law of the silicon-based surface morphology. The invention has the following characteristics: firstly, the nanostructure silicon base surface morphology is changed through the thermal conductivity of the contact material. Second, the nanostructured silicon substrate is irradiated with a laser, which is clean, environmentally friendly, and does not produce any pollution. Third, the time required to change the surface morphology of the nanostructured silicon base is short and the efficiency is high.
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Description

technical field

[0001] The invention belongs to the technical field of nanostructure research, and in particular relates to a research method for controlling the surface morphology of nanostructured silicon substrates based on laser. Background technique

[0002] Nanostructured silicon-based materials are new materials developed on the basis of silicon materials, and are playing an increasingly important role in the field of MEMS (micro-electromechanical systems). With the continuous development and improvement of MEMS (micro-electromechanical systems), the silicon-based surface morphology required on these micro-devices has become more and more complex and diverse.

[0003] At present, it has been possible to form silicon-based surface morphology on nanostructured silicon-based materials, but this technology is not yet mature, mainly in how to control the silicon-based surface morphology. For changing the silicon-based surface morphology on nanostructured silicon-based mat...

Claims

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