Slowly-lift cleaning frame

Abstract

The invention provides a slowly-lift cleaning frame, which comprises a lift frame, a motor assembly arranged under the lift frame and a product piece box. The lift frame is positioned under the product piece box to carry the product piece box. The motor assembly is positioned under the lift frame, and is connected with the lift frame through a crawler belt. The entire lift frame can be lift slowly and steadily through slow running of a motor to enable products to be placed steadily in a solution. The rotating speed is reduced through the motor assembly. Meanwhile, the space of the lift frame can be limited in a cleaning tank, the lifting smoothness is improved, and the quality of products is improved.

Description

technical field [0001] The invention relates to a washing rack, in particular to a slowly lifting washing rack. Background technique [0002] In the production process of electronic components, the cleaning of silicon wafers is very important. The purpose of cleaning is to eliminate all kinds of pollutants adsorbed on the surface of silicon wafers, and to make a suede structure that can reduce the reflection of sunlight on the surface, and the cleaning is clean The degree directly affects the yield and reliability of cells. Texturing is the first process for manufacturing crystalline silicon cells, also known as "surface texturing". The effective textured structure makes the incident light reflect and refract multiple times on the surface of the silicon wafer, which increases the light absorption, reduces the reflectivity, and helps to improve the performance of the battery. In the prior art, the hydrochloric acid pipeline and the hydrofluoric acid pipeline are introduced ...

AI Technical Summary

Problems solved by technology

However, during the actual cleaning process, the liquid level of the silicon wafer in the hydrochloric acid tank is greatly disturbed, which may cause certain deformations to the tiny components of the silicon wafer placed therein.

[0003] The existing technical method is to slowly put the product cassette into the cleaning tank by grabbing the robot arm. This top-down placement method is easy to interfere with the liquid level, and at the same time, it will also affect the product in the solution when it is taken out. Position interference, resulting in a large disturbance of the liquid level, affecting the quality of finished silicon wafers

[0004] If the effect of slow lifting can be achieved by using a slow-rotating motor, but the reducer supporting the motor takes up a lot of space, and it is difficult to distribute it when the cleaning tank is full of solutions. How to use the motor to operate in a limited space has become a manufacturing problem for manufacturers. A big problem when equipment

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