The invention belongs to the field of washing and drying equipment, and particularly discloses a rotary washing and drying device. The rotary washing and drying device comprises a machine base, a washing frame, a liquid tank, a supporting shell and a washing mechanism, the supporting shell and the washing frame are fixedly installed on the end face of the machine base, the washing mechanism is installed on the inner side of the washing frame, and the liquid tank is fixedly installed on the top of the washing frame. The supporting shell is arranged on the inner side of the cleaning frame, fixing bases are connected to the two sides of the supporting shell, and a fixing frame is installed at the top of the supporting shell; the cleaning mechanism comprises a driving assembly, a cleaning brush, a box body and a flushing frame, the box body is fixedly installed on the two sides of the top of the cleaning frame, and a rotating disc is arranged in the box body; and the driving assembly is provided with a motor, a rotating rod and a transmission rod, the motor is fixedly installed at the top end of the supporting shell, and the motor output end is connected with the rotating rod. The wafer is cleaned and then dried, so that the wafer enters and exits in a dry mode, the wafer is prevented from being polluted by the external environment in the technological process, the space occupied by equipment is saved, and a better cleaning effect is achieved through washing and brushing.