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A soi-based heterojunction thermally insensitive laser structure and fabrication method

A laser and heterojunction technology, applied in the field of lasers, can solve the problems affecting the development of optical modules, increasing the power consumption of optical modules, and inconvenient packaging, so as to facilitate integration and mass production, keep the optical wavelength stable, and reduce power consumption Effect

Active Publication Date: 2019-10-29
WUHAN TELECOMM DEVICES
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The introduction of TEC not only increases the power consumption of the entire optical module, but also brings great inconvenience to the packaging. The same packaging form, such as four-channel SFP interface (Quad Small Form-factor Pluggable, abbreviated as: QSFP), CFP4, etc. Free up part of the space to package TEC, the reduction of chip packaging space limits the introduction of multi-channel communication wavelengths, and affects the development of multi-channel high-speed optical modules

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  • A soi-based heterojunction thermally insensitive laser structure and fabrication method
  • A soi-based heterojunction thermally insensitive laser structure and fabrication method
  • A soi-based heterojunction thermally insensitive laser structure and fabrication method

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Embodiment 1

[0039] Embodiment 1 of the present invention provides a heterojunction thermally insensitive laser structure based on Silicon-On-Insulator (SOI for short), such as figure 1 As shown, it includes an SOI substrate 1, a waveguide in the active region of the III-V group, a polymer waveguide 3 with a negative temperature coefficient of refractive index, and a silicon waveguide 4. The polymer waveguide 3 and the silicon waveguide 4 are located on the SOI substrate 1, specifically:

[0040] The light outlet of the III-V group active region waveguide 2 is coupled to the light inlet of the silicon waveguide 4, and the light outlet of the silicon waveguide 4 is coupled to the light inlet of the polymer waveguide 3; the polymer The light exit port of the waveguide 3 is coupled with the light exit port of the laser.

[0041]The embodiment of the present invention can realize the thermal insensitivity of the laser, and when the temperature changes, the optical wavelength of the laser is s...

Embodiment 2

[0055] After proposing an SOI-based heterojunction heat-insensitive laser structure as described in Embodiment 1, the embodiment of the present invention further proposes a problem that can further improve the influence of temperature on the laser wavelength. Such as Figure 8 As shown, the laser proposed by the embodiment of the present invention includes an SOI substrate 1, a waveguide 2 in the active region of the III-V group, a polymer waveguide 3 with a negative refractive index temperature coefficient, a silicon waveguide 4, a first SiO2 waveguide 8 and a second SiO2 The waveguide 9, the waveguide 2 in the active region of the III-V group, the polymer waveguide 3 with a negative refractive index temperature coefficient, the silicon waveguide 4, the first SiO2 waveguide 8 and the second SiO2 waveguide 9 are located on the SOI substrate 1, specifically of:

[0056] The light outlet of the III-V active region waveguide 2 is coupled to the light inlet of the silicon wavegui...

Embodiment 3

[0065] The embodiment of the present invention also provides a method for fabricating an SOI-based heterojunction thermally insensitive laser, such as Figure 9 As shown, the method includes:

[0066] In step 201, a silicon waveguide 4 pattern is fabricated on the SOI substrate 1 by photolithography, wherein the light entrance and light exit of the silicon waveguide 4 pattern are respectively made into tapered shapes.

[0067] Wherein, the coupling combination between the light entrance of the silicon waveguide 4 and the light exit of the waveguide 2 in the III-V active region can adopt the following two methods.

[0068] method one:

[0069] Such as figure 2 and image 3 As shown, the light entrance of the silicon waveguide 4 is tapered, and the coupling between the III-V active region waveguide 2 and the tapered light entrance of the silicon waveguide 4 is completed. in, figure 2 is a schematic diagram of the enlarged local structure of the top view of the correspondi...

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Abstract

The invention relates to the technical field of lasers, and provides an SOI-based heterojunction thermal-insensitive laser structure and a manufacturing method, wherein the structure comprises an SOI substrate, an III-V active area waveguide, a polymer waveguide having a negative refractive index temperature coefficient and a silicon waveguide; the light exit of the III-V active area waveguide is coupled to the light inlet of the silicon waveguide; the light exit of the silicon waveguide is coupled to the light inlet of the polymer waveguide; and the light exit of the polymer waveguide is coupled to the light exit of the laser. By means of the embodiment of the invention, thermal insensitivity of the laser can be realized; when temperature is changed, the optical wavelength of the laser is constant; a TEC does not need to be additionally used to control the temperature; therefore, the power consumption of a module can be greatly reduced; encapsulation of more optical channels in the same encapsulation manner can be realized; the laser in the embodiment of the invention is manufactured on an SOI; a chip can emit light, which can directly enter the optical waveguide to transmit; additional coupling is not needed; and integration and batch production are easily carried out.

Description

【Technical field】 [0001] The invention relates to the technical field of lasers, in particular to an SOI-based heterojunction thermally insensitive laser structure and manufacturing method. 【Background technique】 [0002] As the demand for information transmission bandwidth has been growing at an explosive rate, in order to meet the rapid development of network traffic, in the backbone network, 40Gbps and 100Gbps optical networks have begun commercial deployment, and 400Gbps or 1Tbps optical communication systems have also begun research. The development of high-speed and wide-bandwidth requires the wavelength interval of wavelength division multiplexing to be smaller and smaller, especially after the rate reaches 100Gbps, the communication window of LWDM (LinkedWavelength Division Multiplexing) requires the wavelength to change in the range of 2nm, and the existing laser chip will change with the temperature. change and wavelength shift. In the packaging of high-speed opti...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01S5/028H01S5/20
CPCH01S5/0284H01S5/20
Inventor 常江李庭宇周日凯付永安孙莉萍
Owner WUHAN TELECOMM DEVICES
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