Moisturizing poria cocos mask

A Poria cocos facial mask, wet-type technology, applied in the field of moisturizing Poria cocos facial mask, can solve the problems of unsatisfactory moisturizing effect, excessive chemical components, and easy loss of nutrient solution, etc., achieve relief and easy infection, relieve skin allergies, and good moisturizing effect Effect

Inactive Publication Date: 2018-04-13
HUNAN LONGFENG PORIA COCOS SCI & TECH
View PDF9 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, the existing moisturizing facial masks have unsatisfactory moisturizing effects, and there are too many chemical components in some facial mask components. Such facial masks will not only not play a maintenance role, but sometimes make the condition of the skin worse
There are also some plant-based masks that extract the essence of plants to achieve the maintenance function of facial skin, but the effect achieved by the combination of nutrients is difficult to study, and at the same time, the nutrient solution is also easy to lose, resulting in waste, and it is impossible to achieve a real moisturizing effect.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Moisturizing poria cocos mask

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0017] In order to make it easy to understand the technical means, creation features, achieved goals and effects of the present invention, the present invention will be further described below with reference to the specific figures.

[0018] see figure 1 A preferred embodiment of the moisturizing Poria mask, in this embodiment, the non-woven bandage includes an upper functional layer and a lower substrate layer, wherein the functional layer includes a facial mask paper layer 1, a collagen layer 2, and a perforated layer. The plastic film 3 and the water-based gel layer 4, wherein the water-based gel layer 4 is a pharmaceutical-grade polyvinyl alcohol water-based gel layer, the entire water-based gel layer 4 is the basic structure layer of the functional layer, and its thickness is 2 mm, and the collagen The layer 2 is formed on the aqueous gel layer 4 with a thickness of 1.2 mm, and a hemostatic powder and aminopeptide are added therein as a medicinal part. A layer of perfora...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
pore sizeaaaaaaaaaa
Login to view more

Abstract

The invention discloses a moisturizing poria cocos mask which comprises a functional layer and a substrate layer with two non-woven fabric structures, wherein the functional layer comprises an aqueousgel layer, a plastic film with holes and a collagen layer. A mask paper layer is also formed on the surface of the collagen layer as a body contact surface layer, and a nutrient liquid prepared froma poria cocos extraction solution, a cucumber extraction solution, a radix polygonati officinalis extraction solution, an aloe extraction solution, a ginseng extraction solution and vitamin E infiltrate the mask paper layer and the collagen layer. The moisturizing poria cocos mask disclosed by the invention has the characteristics of being good in moisturizing effect and good in ventilating property, and meanwhile, can alleviate skin allergy and easy infection effectively.

Description

technical field [0001] The invention relates to the technical field of cosmetics, in particular to a moisturizing Poria mask with a collagen dressing layer. Background technique [0002] At present, people are under great pressure from life and work, so that people's skin conditions are not ideal, and they are extremely lack of moisture, which not only affects the balance of water and oil on the face, but also easily increases the chance of wrinkles due to lack of moisture. . The mask is easy to use, can timely and effectively add moisture to the skin, smooth fine lines, and at the same time make up for the cleaning effect that makeup remover and face wash cannot achieve. It has developed into a daily skin care product for female consumers. [0003] However, the existing moisturizing masks have unsatisfactory moisturizing effects, and some of the mask ingredients contain too many chemical components. Such masks not only do not play a maintenance role, but also sometimes mak...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/9789A61K8/9794A61K8/9728A61K8/67A61K8/65A61K8/02A61Q17/00A61Q19/00
CPCA61K8/0212A61K8/65A61K8/678A61K8/97A61K2800/72A61Q17/005A61Q19/00A61Q19/005
Inventor 陈龙
Owner HUNAN LONGFENG PORIA COCOS SCI & TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products