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Residual stress measuring device and residual stress measuring method

A residual stress and measuring device technology, applied in measuring devices, instruments, scientific instruments, etc., can solve the problem of time-consuming, and achieve the effect of shortening the measuring time

Active Publication Date: 2020-05-08
SINTOKOGIO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] However, the device described in Patent Document 1 may take time to measure the residual stress
Signal reading can take time, e.g. due to the need to rotate the imaging plate to acquire the signal

Method used

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  • Residual stress measuring device and residual stress measuring method
  • Residual stress measuring device and residual stress measuring method
  • Residual stress measuring device and residual stress measuring method

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Experimental program
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Embodiment Construction

[0018] Hereinafter, this embodiment will be described with reference to the drawings. In addition, in the following description, the same code|symbol is attached|subjected to the same or equivalent element, and the overlapping description is abbreviate|omitted.

[0019] The residual stress measurement device 1 of the present embodiment is a device for measuring the residual stress of a measurement object using X-rays. The residual stress measurement device 1 can be employed, for example, when inspecting the quality of manufactured products in a factory production line, but is not limited thereto. The object to be measured can be, for example, non-oriented (isotropic crystal structure) and formed of a metal polycrystalline material.

[0020] figure 1 It is a schematic diagram explaining the structure of the residual stress measurement apparatus 1 of this embodiment. Such as figure 1 As shown, the residual stress measurement device 1 includes a device main body 100 including...

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Abstract

The present invention provides a residual stress measurement device and a residual stress measurement method. The device includes: an X-ray generator that irradiates an X-ray to a measurement target object; and a first detection element that detects diffraction of the measurement target object at a first detection position. The intensity of X-rays; the second detection element, which detects the intensity of the diffracted X-rays of the measurement object at a second detection position different from the first detection position; a movement mechanism, which makes the first detection element and The second detection elements move along straight lines extending in a direction perpendicular to the incident direction of the X-rays; a movement control unit drives the movement mechanism and controls the first detection element and the second detection element. a detection position of each of the detection elements; a stress calculation unit that calculates the measurement target based on the intensity peak values ​​of the diffracted X-rays detected by the movement of the first detection element and the second detection element by the moving mechanism, respectively. the residual stress of the object.

Description

technical field [0001] The invention relates to a residual stress measuring device and a residual stress measuring method. Background technique [0002] Patent Document 1 describes an apparatus for measuring residual stress of an object to be measured using X-rays. This device includes: an X-ray emitter that emits X-rays to the object to be measured, an imaging plate that receives diffracted light from the object to be measured, a rotation mechanism that rotates the imaging plate, a laser device that reads from the imaging plate, and controls these components. controller. [0003] The controller stores in advance the shape of the diffraction ring corresponding to the residual stress as a reference. Then, the device uses the imaging plate to receive the diffracted light from the object to be measured, and uses the rotating mechanism to rotate the imaging plate while using the laser device to read the photosensitive intensity to obtain the diffraction ring, and compares the ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01N23/207
CPCG01N23/207G01N23/20008
Inventor 小林祐次松井彰则
Owner SINTOKOGIO LTD