Vacuum throttling device and system
A throttling device, vacuum technology, applied in electrical components, semiconductor/solid-state device manufacturing, circuits, etc., can solve the problems of surface scratches, system damage, high purification degree requirements, etc., to achieve good stability, high wear resistance and the effect of hardness
Inactive Publication Date: 2018-06-29
BEIJING SEMICON EQUIP INST THE 45TH RES INST OF CETC
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Problems solved by technology
The surface of the throttle device used in the prior art will be severely scratched, and the metal slag from grinding will completely block all the small holes of the throttle device, causing damage to the entire system
[0007] Therefore, the requirements for the purification degree of the working environment of the equipment are relatively high, which greatly reduces the scope of application scenarios of this structure
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[0036] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. The following detailed description of the embodiments of the invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but merely represents selected embodiments of the invention. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without making creative efforts belong to the protection scope of the present invention.
[0037] The embodiment of the present invention provides a vacuum throttling device 3, the vacuum throttling device 3 includes a casing 32, an inner ring 33 and a vent core 31, the casing 32 is provided with a first through hole for ventilation, t...
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The embodiment of the invention provides a vacuum throttling device and system. The vacuum throttling device comprises a housing, an inner ring and a ventilation core, the housing is provided with a first through hole used for ventilation, one end of the first through hole is filled with the ventilation core, the inner ring is spliced to the inner wall of the other end of the through hole to support the ventilation core, and the ventilation core is micropore ceramic materials. The ventilation core is micropore ceramic materials and is different from the prior art that a small hole is arrangedat the stainless steel or copper materials for ventilation, and therefore, compared to the prior art, the ventilation core made of the micropore ceramic materials is not easy to generate wearing, scratching and obstruction conditions, the ventilation core made of the micropore ceramic materials is lower in the environment purifying requirement than the small hole arranged at the stainless steel orcopper materials in the purifying requirement, and the application scene of the vacuum throttling device is expanded.
Description
technical field [0001] The invention relates to the field of semiconductors, in particular to a vacuum throttling device and system. Background technique [0002] In the process of semiconductor special equipment manufacturing and development, in order to improve the processing accuracy and reliability of the equipment, it is usually necessary to achieve approximately frictionless rotational motion in structures such as workbenches, air spindles, and air bearings. Therefore, a vacuum throttling device is needed. The working principle of the vacuum throttling device is: let the gas pass through the vacuum throttling device, form a gas film on the surface of the top of the vacuum throttling device, and lift the rotating mechanism to make it rotate There is a slight amount of float in the process, achieving a nearly frictionless rotational movement. This structure is widely used in related parts of semiconductor devices. [0003] Traditional vacuum throttling devices use stai...
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IPC IPC(8): H01L21/67
CPCH01L21/67
Inventor 张敏杰费玖海张志军佀海燕
Owner BEIJING SEMICON EQUIP INST THE 45TH RES INST OF CETC