An exposure method and an exposure device thereof

An exposure method and technology of an exposure device, which are applied to exposure devices for photo-engraving processes, microlithography exposure equipment, optics, etc., can solve problems such as poor product alignment accuracy and long takt time of exposure machines.

Active Publication Date: 2019-01-01
CHONGQING HKC OPTOELECTRONICS TECH CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In the manufacturing process of display panels, there are many processes that need to be exposed. Generally, an exposure machine is used, but the exposure machine has a long exposure cycle time, and the output product alignment accuracy is not good.

Method used

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  • An exposure method and an exposure device thereof
  • An exposure method and an exposure device thereof
  • An exposure method and an exposure device thereof

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Embodiment Construction

[0050] Specific structural and functional details disclosed herein are representative only and for purposes of describing example embodiments of the present invention. This invention may, however, be embodied in many alternative forms and should not be construed as limited to only the embodiments set forth herein.

[0051] In describing the present invention, it is to be understood that the terms "central", "lateral", "upper", "lower", "left", "right", "vertical", "horizontal", "top", The orientation or positional relationship indicated by "bottom", "inner", "outer", etc. is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying the referred device Or elements must have a certain orientation, be constructed and operate in a certain orientation, and thus should not be construed as limiting the invention. In addition, the te...

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PUM

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Abstract

The invention discloses an exposure method and an exposure device thereof. The exposure method comprises the following steps: confirming the position of a point to be exposed in an area to be exposed;capturing the point to be exposed and confirming that the exposure point to be exposed is successfully captured; adjusting a light source to an appropriate position corresponding to the successfullycaptured point to be exposed; and completing the exposure operation by an exposure machine. The invention can reduce the pitch time of working of the exposure machine and improve the alignment accuracy of output products.

Description

technical field [0001] The present invention relates to the field of display technology, in particular to an exposure method and an exposure device thereof. Background technique [0002] With the development and progress of science and technology, liquid crystal displays have become the mainstream products of displays due to their thin body, power saving and low radiation, and have been widely used. Most of the liquid crystal displays currently on the market are backlight liquid crystal displays, which include a liquid crystal panel and a backlight module. The working principle of the liquid crystal panel is to place liquid crystal molecules between two parallel glass substrates, and apply a driving voltage on the two glass substrates to control the rotation direction of the liquid crystal molecules, so as to refract the light from the backlight module to produce a picture. [0003] Among them, Thin Film Transistor-Liquid Crystal Display (TFT-LCD) has gradually occupied a d...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/70141G02F1/1303G03F7/70258G03F7/70275G03F7/70641
Inventor 倪伟
Owner CHONGQING HKC OPTOELECTRONICS TECH CO LTD
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