48results about How to "Avoid underexposure" patented technology

The invention discloses an exposure regulation terminal and method based on double cameras, and relates to the technical field of image processing. The exposure regulation terminal based on double cameras comprises a first camera module, a second camera module and a regulation control module, wherein the regulation control module is used for respectively controlling and regulating a first shooting parameter of the first camera module and a second shooting parameter of the second camera module when a first exposure quantity exceeds a second exposure quantity preset range so as to enable the first exposure quantity and a second exposure quantity to be in the preset range. According to the exposure regulation terminal and method based on double cameras, which are disclosed by the invention, a foreground image is obtained by a first camera, a background image is obtained by a second camera, shooting parameters of the first camera and the second camera are regulated according to the exposure quantities of the foreground image and the background image to enable the exposure quantities of the foreground image and the background image to be consistent, so that an exposure effect of a synthetic image is ensured.

The invention discloses a light compensating method and electronic equipment. The light compensating method is applied into the electronic equipment. The electronic equipment comprises a projection module and an image acquiring module. The light compensating method includes determining projection parameters of the projection module when the image acquiring module acquires images of a first area; controlling the projection module to generate light corresponding to the projection parameters so as to compensate light of the first area, wherein the illumination intensity of the light in a first subrange in the first area is a first value, and the illumination intensity of the light in a second subrange different from the first subrange in the first area is a second value different from the first value.

A radiotherapy treatment support apparatus includes a storage unit which stores absorption dose volume data expressing a spatial distribution of absorption dose in a subject, a generation unit which generates fusion data associated with morphology volume data of the subject and the absorption dose volume data so as to be associated with a plurality of segments, and a display unit which displays an image which has the distribution of absorption dose superimposed on the two-dimensional morphology image of the subject using the fusion data.

Provided are a substrate for a display panel, wherein short-circuiting between wiring electrode terminals can be eliminated, and a display panel. The substrate for a display panel is provided with: a wiring electrode terminal (121) for connecting an external wiring board; an extraction wiring line (122) which is electrically connected to the wiring electrode terminal (121); an interlayer insulating film (209) which covers the extraction wiring line (122); a conductive material film (210) which is formed by being superimposed on the wiring electrode terminal (121) and is electrically connected to the wiring electrode terminal (121); and a conductive material film (211) which is formed by being superimposed on the extraction wiring line (122) with the interlayer insulating film (209) therebetween and is electrically connected to the extraction wiring line (122). The conductive material film (210) formed by being superimposed on the wiring electrode terminal (121) and the conductive material film (211) formed by being superimposed on the extraction wiring line (122) with the interlayer insulating film (209) therebetween are separated from each other at the periphery of the interlayer insulating film (209).

The invention provides a method and device for filling light during photographing for improving the photographing quality of pictures or videos of an intelligent terminal. The method comprises the following steps: whether a part which needs to fill light exists in a current object to be photographed; if the part which needs to fill light exists in the current object to be photographed, then stopping automatic light metering and parameter adjustment operations of a camera module; transmitting a command required for filling light for the part which needs to fill light to a flash adjustment module; and after receiving other parameters and the command by the flash adjustment module, opening a flash to fill light for the part which needs to fill light. The technical scheme of the invention effectively prevents the overall light filling for the object to be photographed and prevents overexposure for some parts of the object to be photographed on one hand; and on the other hand, avoids the underexposure of the part which needs to fill light in the photographing object, so that the photographing quality of the pictures or videos and so on can be improved.

This invention discloses an image pickup device and an image synthesis method thereof The image pickup device comprises an image-pickup module, an image-synthesis module, a database and a processing module. The image-pickup module captures a plurality of temporary images of a scene. The image-synthesis module extracts a part of each temporary image and combines the parts to form a panorama temporary image, and splits the panorama temporary image into a plurality of zone-areas according to at least one threshold value and a panorama luminosity histogram. The database stores a lookup table for recording a plurality of exposure values. The plurality of the exposure values correspond to luminance values of the zone-areas respectively. The processing module obtains the plurality of exposure values corresponding to the luminance values and obtains a weighting-exposure value by an equation, and controls the image-pickup module to capture the panorama image according to the weighting-exposure value.

A UV-ray irradiator comprising a UV-ray irradiating section (12) having a plurality of UV-ray emitting diodes (21) arranged on a substrate (20) and disposed oppositely to a body being irradiated, i.e. a semiconductor wafer, applied with a protective sheet S through a UV-curing adhesive layer. The UV-ray emitting diodes (21) are arranged, at a constant interval, on a plurality of lines L1 substantially perpendicularly intersecting the direction of relative movement with respect to the wafer such that a part of the UV-ray emitting diodes (21) in the adjacent row is located between the adjacent UV-ray emitting diodes (21) in each row.

The name of the invention is a water stemming of a discharge hole of a quartz crucible material-preparation furnace. The invention belongs to the technical field of material preparation of environment-friendly optical glass and lanthanide optical glass. The invention mainly solves the problem of cracking of a crucible bottom when a quartz crucible is used to prepare raw materials of environment-friendly optical glass or lanthanide optical glass at present. The main characteristics are that: the water stemming comprises a water stemming body, and an inlet pipe and an outlet pipe which are disposed on a lower end surface of the water stemming body; an upper end surface of the water stemming body is a conical surface fitted to a discharge hole with a cone angle of 110 DEG-130 DEG; the water stemming body is made of heat-resistant stainless steel with an external diameter of phi 36-phi 45 mm, a wall thickness of not less than 3.5 mm, and an upper end surface thickness of not less than 4 mm; an upper port of the outlet pipe is higher than an upper port of the inlet pipe by 8 mm-12 mm. The invention is characterized in that: the invention not only meets the production requirements of a quartz crucible material-preparation furnace, but also effectively protects the quartz crucible, reduces production cost, and improves production efficiency, and the invention is mainly used to plugging the discharge hole at the crucible bottom when a quartz crucible is used to prepare raw materials of environment-friendly optical glass or lanthanide optical glass.

The invention discloses a method for acquiring skin brightness in a camera data stream and adjusting exposure degree, which belongs to the technical field of image processing and comprises the following steps of: S1, acquiring frames in the camera data stream; S2, acquiring pixel points in each frame; S3, traversing the pixel points obtained in the step S2 to obtain RGB values of the pixel points;S4, converting the RGB value of the pixel point obtained in the step S3 into a YCbCr value; S5, performing screening to obtain skin data according to the YCbCr value obtained in the step S4; S6, according to the skin data, calculating to obtain an average brightness value of the skin data, and obtaining skin brightness; On the basis, the method comprises the following steps: (1) obtaining video stream data collected by a camera, and obtaining the skin brightness every other fixed frame rate; And (2) judging whether the skin brightness is within a threshold range or not, and adjusting the exposure degree according to a judgment result, so that the problem that the local accurate exposure adjustment cannot be carried out on the frame data in the camera data flow in the prior art is solved.

The invention discloses an intelligent AE algorithm for mobile phone flash photography, which includes the following steps: S1, in a dark environment, start the camera function of the mobile phone, turn on the flashlight or perform Auto flash setting; S2, press the camera button, and the camera starts the flashlight pre-flash Mechanism; S3. The sensor detects the light intensity returned by the subject during the pre-flash; S4. The processor chip analyzes the light signal received by the sensor from the subject; S5. According to the analysis result, automatically adjust the optimal main lightning current intensity and AE compensation value; if the return light is strong, the main flash will reduce the main flash current and AE compensation value accordingly, and if the return light is weak, the main flash will increase the main flash current and AE compensation value accordingly. The present invention avoids over-exposure or under-exposure of the imaging picture taken by the flashlight, and at the same time can reasonably distribute the current and power of the flashlight of the mobile phone camera, so as to maximize the battery use efficiency.

The invention provides a camera exposure parameter adjustment method, a device, a system, equipment and a storage medium. The method is applied to a system detection equipment and camera equipment, and a detection view field of the detection equipment and an imaging view field of the camera equipment have an intersection. The method comprises the following steps: upon detecting a target object by detection equipment, the first position information of the detected target object is obtained, the first position information is converted into second position information according to a conversion relation, and the conversion relation is a conversion relation between a first coordinate system applied by the detection equipment and a second coordinate system applied by the camera equipment; a first photometric area containing the target object from an image shot is determined by the camera device according to the second position information, and a second exposure parameter used for replacing a current first exposure parameter of the camera device is determined according to brightness information of the first photometric area; and the camera equipment is controlled to perform exposure imaging according to the second exposure parameter to generate an image containing the target object. The imaging quality of the target object can be improved.

The invention provides an RGBW-based Micro-LED preparation system, which comprises a developing machine, an etching machine, a light source module, a mask plate and an array substrate coated with photoresist; the mask plate and the array substrate coated with photoresist are sequentially arranged in the light emitting direction of the light source module; the light source module comprises four groups of light sources, each group of light sources corresponds to one sub-pixel structure in a display pixel, the mask comprises a plurality of light-transmitting areas, and the projection of the center of each light-transmitting area on the array substrate is located at the center of the sub-pixel structure corresponding to the light-transmitting area; when the photoresist is exposed, the four groups of light sources simultaneously penetrate through the light-transmitting area of the mask to expose the photoresist at the sub-pixel structures, and the exposure illumination intensity and the exposure illumination duration of each group of light sources are determined according to the volume of quantum dot colloid to be filled in the sub-pixel structures corresponding to the light sources; the developing machine and the etching machine carry out subsequent processing on the exposed array substrate so as to form the liquid storage tank; according to the invention, the problem of unbalanced sub-pixel luminance caused by different sealing glue thicknesses of quantum dots can be solved.

The embodiment of the invention discloses an automatic exposure control method, applied to an X-ray machine. The method comprises the following steps: sending initial tube voltage and initial tube current to a high voltage generator, so that the high voltage generator emits X rays according to the initial tube voltage and the initial tube current, and exposure begins; detecting feedback voltage generated by an ionization chamber, thus obtaining first comparison voltage; acquiring reference voltage when the first comparison voltage is greater than or equal to sampling voltage; further detectingfeedback voltage generated by the ionization chamber, thus obtaining second comparison voltage; when the second comparison voltage is greater than or equal to the reference voltage, switching off thehigh voltage generator, and thus exposure stops. Thus, the reference voltage is set according to the practical exposure process, so that the setting of the reference voltage is more reasonable, the accuracy in controlling automatic exposure is guaranteed, an exposure image with ideal gray scale is obtained, the stable and reliable quality of the exposure image is guaranteed, and therefore, the situation that the exposure is insufficient or excessive existing due to setting of the reference voltage by virtue of experience in the prior art is avoided.

The invention discloses an exposure method and an exposure device thereof. The exposure method comprises the steps of: confirming the position of the point to be exposed in the area to be exposed; capturing the point to be exposed, and confirming that the point to be exposed is successfully captured; Adjust the light source to the appropriate position at the point to be exposed successfully; the exposure machine completes the exposure operation. The invention can reduce the takt time of the exposure machine and improve the alignment accuracy of the output products.

The invention discloses a scene image processing method and device, which mainly includes: acquiring the gray value of each pixel in the pre-shot image of the scene to be photographed, and determining respectively according to the determined first combination area and the second combination area The first exposure amount and the second exposure amount respectively affect the gray value of each pixel point in the first image area corresponding to the first combination area in the first image obtained by shooting with the first exposure amount, and the gray value of each pixel point in the first image area corresponding to the first combination area when shooting with the second exposure amount In the obtained second image, the gray value of each pixel in the second image area corresponding to the second combination area is adjusted, and the adjusted two image areas are spliced ​​to obtain a scene image. Thus, the problem of overexposure or underexposure of the image due to the large difference between light and dark in the shot scene is avoided, the scene details of the shot scene are preserved to the greatest extent, and at the same time, the difference between the light and dark areas in the shot scene is restored to the greatest extent. Brightness relationship, so that the image quality of the scene is more high-quality.

The invention relates to a Micro-LED manufacturing method for improving sub-pixel light emission balance. The method includes: coating photoresist on the light-receiving surface of an array substrate; adjusting a mask so that the light-transmitting area of ​​the mask corresponds to each Display pixels; keep the relative position of the mask and the array substrate unchanged, and use three groups of light sources with different incident directions to simultaneously pass through the light-transmitting area of ​​the mask to expose different groups of sub-pixels; wherein, each group of light sources corresponds to a A group of sub-pixels of the same color, the illumination intensity and illumination time of each group of light sources are determined according to the volume of quantum dot colloid to be filled in the sub-pixels of the corresponding color of the group of light sources; the photoresist on the array substrate is subjected to the first time using the developer solution. dissolve; dry the array substrate, and etch the sub-pixels to form three liquid storage tanks with different depths. The method is beneficial to improve the luminous brightness balance of the sub-pixels and improve the display effect.