48results about How to "Avoid underexposure" patented technology

A radiotherapy treatment support apparatus includes a storage unit which stores absorption dose volume data expressing a spatial distribution of absorption dose in a subject, a generation unit which generates fusion data associated with morphology volume data of the subject and the absorption dose volume data so as to be associated with a plurality of segments, and a display unit which displays an image which has the distribution of absorption dose superimposed on the two-dimensional morphology image of the subject using the fusion data.

Provided are a substrate for a display panel, wherein short-circuiting between wiring electrode terminals can be eliminated, and a display panel. The substrate for a display panel is provided with: a wiring electrode terminal (121) for connecting an external wiring board; an extraction wiring line (122) which is electrically connected to the wiring electrode terminal (121); an interlayer insulating film (209) which covers the extraction wiring line (122); a conductive material film (210) which is formed by being superimposed on the wiring electrode terminal (121) and is electrically connected to the wiring electrode terminal (121); and a conductive material film (211) which is formed by being superimposed on the extraction wiring line (122) with the interlayer insulating film (209) therebetween and is electrically connected to the extraction wiring line (122). The conductive material film (210) formed by being superimposed on the wiring electrode terminal (121) and the conductive material film (211) formed by being superimposed on the extraction wiring line (122) with the interlayer insulating film (209) therebetween are separated from each other at the periphery of the interlayer insulating film (209).

The invention discloses an intelligent AE algorithm for mobile phone flash photography, which includes the following steps: S1, in a dark environment, start the camera function of the mobile phone, turn on the flashlight or perform Auto flash setting; S2, press the camera button, and the camera starts the flashlight pre-flash Mechanism; S3. The sensor detects the light intensity returned by the subject during the pre-flash; S4. The processor chip analyzes the light signal received by the sensor from the subject; S5. According to the analysis result, automatically adjust the optimal main lightning current intensity and AE compensation value; if the return light is strong, the main flash will reduce the main flash current and AE compensation value accordingly, and if the return light is weak, the main flash will increase the main flash current and AE compensation value accordingly. The present invention avoids over-exposure or under-exposure of the imaging picture taken by the flashlight, and at the same time can reasonably distribute the current and power of the flashlight of the mobile phone camera, so as to maximize the battery use efficiency.

The embodiment of the invention discloses an automatic exposure control method, applied to an X-ray machine. The method comprises the following steps: sending initial tube voltage and initial tube current to a high voltage generator, so that the high voltage generator emits X rays according to the initial tube voltage and the initial tube current, and exposure begins; detecting feedback voltage generated by an ionization chamber, thus obtaining first comparison voltage; acquiring reference voltage when the first comparison voltage is greater than or equal to sampling voltage; further detectingfeedback voltage generated by the ionization chamber, thus obtaining second comparison voltage; when the second comparison voltage is greater than or equal to the reference voltage, switching off thehigh voltage generator, and thus exposure stops. Thus, the reference voltage is set according to the practical exposure process, so that the setting of the reference voltage is more reasonable, the accuracy in controlling automatic exposure is guaranteed, an exposure image with ideal gray scale is obtained, the stable and reliable quality of the exposure image is guaranteed, and therefore, the situation that the exposure is insufficient or excessive existing due to setting of the reference voltage by virtue of experience in the prior art is avoided.

The invention discloses an exposure method and an exposure device thereof. The exposure method comprises the steps of: confirming the position of the point to be exposed in the area to be exposed; capturing the point to be exposed, and confirming that the point to be exposed is successfully captured; Adjust the light source to the appropriate position at the point to be exposed successfully; the exposure machine completes the exposure operation. The invention can reduce the takt time of the exposure machine and improve the alignment accuracy of the output products.

The invention discloses a scene image processing method and device, which mainly includes: acquiring the gray value of each pixel in the pre-shot image of the scene to be photographed, and determining respectively according to the determined first combination area and the second combination area The first exposure amount and the second exposure amount respectively affect the gray value of each pixel point in the first image area corresponding to the first combination area in the first image obtained by shooting with the first exposure amount, and the gray value of each pixel point in the first image area corresponding to the first combination area when shooting with the second exposure amount In the obtained second image, the gray value of each pixel in the second image area corresponding to the second combination area is adjusted, and the adjusted two image areas are spliced ​​to obtain a scene image. Thus, the problem of overexposure or underexposure of the image due to the large difference between light and dark in the shot scene is avoided, the scene details of the shot scene are preserved to the greatest extent, and at the same time, the difference between the light and dark areas in the shot scene is restored to the greatest extent. Brightness relationship, so that the image quality of the scene is more high-quality.

The invention relates to a Micro-LED manufacturing method for improving sub-pixel light emission balance. The method includes: coating photoresist on the light-receiving surface of an array substrate; adjusting a mask so that the light-transmitting area of ​​the mask corresponds to each Display pixels; keep the relative position of the mask and the array substrate unchanged, and use three groups of light sources with different incident directions to simultaneously pass through the light-transmitting area of ​​the mask to expose different groups of sub-pixels; wherein, each group of light sources corresponds to a A group of sub-pixels of the same color, the illumination intensity and illumination time of each group of light sources are determined according to the volume of quantum dot colloid to be filled in the sub-pixels of the corresponding color of the group of light sources; the photoresist on the array substrate is subjected to the first time using the developer solution. dissolve; dry the array substrate, and etch the sub-pixels to form three liquid storage tanks with different depths. The method is beneficial to improve the luminous brightness balance of the sub-pixels and improve the display effect.