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A kind of exposure method and exposure device thereof

An exposure method and technology of an exposure device, which are applied in photolithography exposure devices, microlithography exposure equipment, optics, etc., can solve the problems of long cycle time of exposure machines and poor product alignment accuracy.

Active Publication Date: 2020-11-20
CHONGQING HKC OPTOELECTRONICS TECH CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In the manufacturing process of display panels, there are many processes that need to be exposed. Generally, an exposure machine is used, but the exposure machine has a long exposure cycle time, and the output product alignment accuracy is not good.

Method used

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  • A kind of exposure method and exposure device thereof
  • A kind of exposure method and exposure device thereof
  • A kind of exposure method and exposure device thereof

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Embodiment Construction

[0050] Specific structural and functional details disclosed herein are merely representative and for purposes of describing exemplary embodiments of the present invention. However, the present invention may be embodied in many alternative forms and should not be construed as limited only to the embodiments set forth herein.

[0051] In the description of the present invention, it should be understood that the terms "center", "lateral", "top", "bottom", "left", "right", "vertical", "horizontal", "top", The orientation or positional relationship indicated by "bottom", "inner", "outer", etc. is based on the orientation or positional relationship shown in the accompanying drawings, and is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying the indicated device. Or elements must have a particular orientation, be constructed and operate in a particular orientation, and therefore should not be construed as l...

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Abstract

The invention discloses an exposure method and an exposure device thereof. The exposure method comprises the steps of: confirming the position of the point to be exposed in the area to be exposed; capturing the point to be exposed, and confirming that the point to be exposed is successfully captured; Adjust the light source to the appropriate position at the point to be exposed successfully; the exposure machine completes the exposure operation. The invention can reduce the takt time of the exposure machine and improve the alignment accuracy of the output products.

Description

technical field [0001] The present invention relates to the field of display technology, and in particular, to an exposure method and an exposure device thereof. Background technique [0002] With the development and progress of science and technology, liquid crystal displays have become the mainstream products of displays due to their thin body, power saving and low radiation, and have been widely used. Most of the liquid crystal displays on the market are backlit liquid crystal displays, which include a liquid crystal panel and a backlight module. The working principle of the liquid crystal panel is to place liquid crystal molecules in two parallel glass substrates, and apply a driving voltage on the two glass substrates to control the rotation direction of the liquid crystal molecules, so as to refract the light from the backlight module to produce a picture. [0003] Among them, Thin Film Transistor-Liquid Crystal Display (TFT-LCD) has gradually occupied a dominant posi...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCG03F7/70141G02F1/1303G03F7/70258G03F7/70275G03F7/70641
Inventor 倪伟
Owner CHONGQING HKC OPTOELECTRONICS TECH CO LTD
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