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Mask protective film structure and mask

A technology of protective film and photomask, which is applied in optics, originals for opto-mechanical processing, instruments, etc., to achieve the effects of small size, reduced deformation, and reduced amount of deformation

Inactive Publication Date: 2019-01-25
YANGTZE MEMORY TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] The technical problem to be solved by the present invention is how to reduce or prevent the deformation of the photomask

Method used

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  • Mask protective film structure and mask
  • Mask protective film structure and mask
  • Mask protective film structure and mask

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Experimental program
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Effect test

Embodiment Construction

[0034] The structure of the existing photomask protective film is prone to deformation, and then the photomask will also be deformed.

[0035] For research findings, please refer to figure 1 , in order to keep the balance of the pressure inside and outside the photomask pellicle structure, at least 6-10 openings 103 will be set on the side wall of the frame 102, the existence of the openings 103 makes the structure of the frame 102 unstable, easy to Stress deformation occurs, so that the frame will be deformed, and then the photomask 20 will also be deformed, and the position of the mask pattern 21 on the photomask 20 will also be deformed or shifted. When the photomask is used in the exposure process, the exposure The final photoresist pattern will also be deformed or shifted in position.

[0036] For this reason, the present invention provides a kind of photomask pellicle structure and photomask, wherein said photomask pellicle structure, the opening on the annular frame ru...

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Abstract

A mask protective film structure and a mask, wherein that mask protective film structure comprise a protective film; An annular frame for supporting and securing the protective membrane, the annular frame having an opening through the annular frame filled with a plurality of filter membranes having through holes. The deformation amount of the mask protective film structure of the invention is small or does not occur deformation.

Description

technical field [0001] The invention relates to the field of semiconductor manufacturing, in particular to a photomask protective film structure and a photomask. Background technique [0002] In the whole process of semiconductor manufacturing, photomask or mask (mask) manufacturing is a process from layout to wafer (wafer) manufacturing. This part is a key part of the process connection, the most expensive part of the process, and one of the bottlenecks that restricts the minimum line width. [0003] A photomask is a high-precision quartz plate used to create images of electronic circuits on a chip to facilitate the production of integrated circuits. Therefore, the manufacturing and storage of the photomask are very strict, so that the precise photomask can be properly preserved, so that the circuit image presented after development can meet the predetermined requirements. Otherwise, when a defective or scratched photomask is used for the lithography process, the imperfec...

Claims

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Application Information

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IPC IPC(8): G03F1/64G03F1/62
CPCG03F1/62G03F1/64
Inventor 方红姜鹏
Owner YANGTZE MEMORY TECH CO LTD
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