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Adjustable circumference electrostatic clamp

A technology of electrostatic chuck and electrostatic clamp, applied in the direction of circuits, discharge tubes, electrical components, etc., can solve the problems of increasing costs and damaging productivity

Pending Publication Date: 2019-05-31
AXCELIS TECHNOLOGIES
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

When implanting workpieces of different sizes or utilizing ion beams of different sizes for implantation, various changes are also made to workpiece handling equipment, increasing costs and compromising productivity

Method used

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  • Adjustable circumference electrostatic clamp
  • Adjustable circumference electrostatic clamp
  • Adjustable circumference electrostatic clamp

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Embodiment Construction

[0040] The present invention is generally directed to a system, apparatus and method for clamping workpieces of various diameters in an ion implantation system. Accordingly, the invention will now be elucidated with reference to the drawings, wherein like reference numerals refer to like elements throughout. It should be understood that the description of these aspects is for illustration only and is not to be construed for purposes of limitation. In the following, for purposes of explanation, several specific details are set forth in order to provide a thorough understanding of the present invention. It will be apparent, however, to one skilled in the art that the present invention may be practiced without these specific details. In addition, the scope of the present invention should not be limited by the embodiments or examples described below with reference to the accompanying drawings, but only by the appended claims and their equivalents.

[0041] It should also be note...

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Abstract

An electrostatic chuck for clamping workpieces having differing diameters is provided. A central electrostatic chuck member associated with a first workpiece and a first peripheral electrostatic chuckmember associated with a second workpiece are provided. An elevator translates the first peripheral electrostatic chuck member with respect to central electrostatic chuck member between a retracted position and an extended position. In the retracted position, the first workpiece contacts only the first surface. In the extended position, the second workpiece contacts the first surface and the second surface. A first peripheral shield generally shields the second surface when the first peripheral electrostatic chuck member is in the retracted position. Additional peripheral electrostatic chuckmembers and peripheral shields can be added to accommodate additional workpiece diameters.

Description

[0001] References to related applications [0002] This application claims the benefit of US Patent Application Serial No. 15 / 281,540, entitled "ADJUSTABLE CIRCUMFERENCE ELECTROSTATIC CLAMP," filed September 30, 2016, the entire contents of which are incorporated herein by reference. technical field [0003] The present invention relates generally to workpiece handling systems, and more particularly to systems and methods for handling workpieces of varying diameters in ion implantation systems. Background technique [0004] In the semiconductor industry, workpieces, such as semiconductor wafers or substrates, are usually transported by means of robots between process steps by workpiece handling systems. Ion implantation systems typically utilize a workpiece handling system to transfer the workpiece between an atmospheric workpiece carrier and a vacuum processing chamber associated with the ion implanter. A conventional workpiece handling system includes a robot having a gr...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/683H01L21/687H01L21/673H01L21/67
CPCH01L21/67213H01J37/31H01L21/67751H01L21/6831H01L21/68707H01L21/68728H01L21/68785H01J37/3171H01J37/20H01L21/6833H01L21/265
Inventor 艾伦·威德
Owner AXCELIS TECHNOLOGIES