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A diversion mechanism, crucible device, evaporation equipment and evaporation method

A technology of a flow guide mechanism and a crucible, which is applied in the field of crucible devices and flow guide mechanisms, and can solve problems such as the inability to recover gas particles from an evaporation crucible

Active Publication Date: 2021-01-22
BOE TECH GRP CO LTD +1
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

[0004] The embodiment of the present invention provides a diversion mechanism, a crucible device, an evaporation equipment, and an evaporation method to solve the technical problem that the gas particles released by the evaporation crucible cannot be recovered in the existing preparation process

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  • A diversion mechanism, crucible device, evaporation equipment and evaporation method
  • A diversion mechanism, crucible device, evaporation equipment and evaporation method
  • A diversion mechanism, crucible device, evaporation equipment and evaporation method

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Embodiment Construction

[0041] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are some of the embodiments of the present invention, but not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.

[0042] see figure 1 , figure 1 It is a schematic structural diagram of a flow guiding mechanism provided by an embodiment of the present invention. Such as figure 1 As shown, the flow guide mechanism 100 includes:

[0043] A collection pipe 110, the collection pipe 110 is a tubular structure with two ends open, the collection pipe 110 includes a first end 111 and a second end 112 for covering the evaporation source;

[0044] A recovery component 12...

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Abstract

The invention provides a flow-guiding mechanism, a crucible device, evaporation-plating equipment and an evaporation-plating method. The flow-guiding mechanism comprises a collecting pipe, a recyclingassembly and a flow-guiding assembly, wherein the collecting pipe is of a tubular structure with the two open ends and comprises a first end and a second end used for being arranged on an evaporationsource in a covering mode, the recycling assembly is arranged at the first end of the collecting pipe in a covering mode, the flow-guiding assembly is arranged in the collecting pipe, a gas inlet ofthe flow-guiding assembly faces the second end, a gas outlet of the flow-guiding assembly faces the first end, and the flow-guiding assembly is used for conducting flow guiding on gas particles released by the evaporation source into the recycling assembly. In this way, the flow-guiding mechanism is additionally arranged to absorb gas molecules released by the standby crucible device during the preset stage, and the situation that the film forming quality of an evaporation-plating technology is affected by the released gas particles is avoided.

Description

technical field [0001] The invention relates to the technical field of semiconductors, in particular to a flow guiding mechanism, a crucible device, evaporation equipment and an evaporation method. Background technique [0002] In order to meet the refinement requirements of semiconductor devices, the requirements for the manufacturing process and manufacturing environment of semiconductor devices are also relatively strict. The preparation process is mostly carried out in a high vacuum environment, and the evaporation crucible existing in the vacuum environment will release impurity particles, which will affect the preparation accuracy of the current process. For example, when using an evaporation system to prepare an organic material film in a high vacuum environment, it is necessary to use an evaporation crucible to evaporate the organic material. Since the evaporation time of a single evaporation crucible is short, it is necessary to preheat the evaporation in a high vac...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/12C23C14/24
CPCC23C14/12C23C14/24C23C14/243
Inventor 仪修超饶勇李靖刘金彪罗楠胡斌岳小非加新星晋亚杰
Owner BOE TECH GRP CO LTD
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