Liquid soaking device for facial mask processing

A liquid and facial mask technology, applied in the field of liquid immersion devices for facial mask processing, can solve the problems of insufficient practical performance, problems affecting the comprehensiveness of facial masks, and only static immersion of facial mask materials, so as to achieve the effect of uniform solution ratio

Inactive Publication Date: 2019-11-05
DONGGUAN XIANGFEI INTELLIGENT EQUIP TECH CO LTD
View PDF0 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Aiming at the deficiencies in the prior art, the present invention provides a liquid soaking device for mask processing, which solves the problem that the existing soaking equipment proposed in the above-mentioned background technology has a relatively simple internal and external structure, and insufficient practical performance during use, which leads to the mask The material can only be kept statically soaked, which indirectly affects the comprehensiveness of the mask during the soaking process

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Liquid soaking device for facial mask processing
  • Liquid soaking device for facial mask processing
  • Liquid soaking device for facial mask processing

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0028] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention.

[0029] In the description of the present invention, unless otherwise stated, the meaning of "plurality" is two or more; the terms "upper", "lower", "left", "right", "inner", "outer" , "front end", "rear end", "head", "tail", etc. indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than Indicates or implies that the device or element referred to must have a particular orientation, be constructed and operate in a particular orientation, and therefore should not be construed as limiting the...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a liquid soaking device for facial mask processing, and relates to the technical field of soaking devices, in particular to the liquid soaking device for facial mask processing. The liquid soaking device comprises a base structure and a horizontal stirring structure. A frame supporting structure is arranged on the upper side of the base structure and internally provided with the horizontal stirring structure. The horizontal stirring structure comprises a transmission crawler, stirring blades, transmission shafts, fixing bearings and a protection ring. The stirring blades are fixed to the outer portion of the transmission crawler. The transmission shafts are arranged in the left end and the right end of the transmission crawler respectively. The fixing bearings are arranged at the lower ends of the transmission shafts. By means of the liquid soaking device for facial mask processing, the structure is improved, and meanwhile the use performance of the whole deviceis greatly improved; the modified device has the horizontal stirring capacity, facial masks are more evenly soaked, and the production quality of the facial masks is improved; by adding an independent feeding mechanism, the use requirements of people are effectively met.

Description

technical field [0001] The invention relates to the technical field of soaking devices, in particular to a liquid soaking device for facial mask processing. Background technique [0002] Mask is a carrier of beauty care products. At present, powder blending, kaolin, non-woven fabric, silk mask, tencel mask, biological fiber mask, and non-woven mask are widely used. Superconducting film mask is the latest generation of innovative technology. , facial mask is a category of skin care products. Its most basic and important purpose is to make up for the insufficient cleaning work of makeup remover and face wash. On this basis, it cooperates with other essence ingredients to achieve other maintenance functions. The mask material needs to be soaked. [0003] However, the internal and external structures of the existing soaking equipment are relatively simple, and the practical performance during use is insufficient, so that the mask material can only be kept statically soaked, whi...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): B01F13/00B01F15/06A61K8/02A61Q19/00
CPCA61K8/0212A61Q19/00A61K2800/10B01F33/26B01F35/93B01F2035/99
Inventor 邓珊李德源林镇炜
Owner DONGGUAN XIANGFEI INTELLIGENT EQUIP TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap