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1155 results about "Protection ring" patented technology

In computer science, hierarchical protection domains, often called protection rings, are mechanisms to protect data and functionality from faults (by improving fault tolerance) and malicious behavior (by providing computer security). This approach is diametrically opposite to that of capability-based security.

Single-photon-level resolution ratio sensor unit structure based on standard CMOS technology

Disclosed is a single-photon-level resolution ratio sensor unit structure based on the standard CMOS technology. The single-photon-level resolution ratio sensor unit structure uses an SPAD. According to the single-photon-level resolution ratio sensor unit structure, basically, a deep N-well (3) is arranged above a P-type silicon substrate (4), a P-well area (2) is formed above the deep N-well (3) and wrapped by the deep N-well (3), an anode contact (9) is connected to the P-well area (2) through a heavy-doping P-well area (1), a cathode contact (10) is connected to an N-well area (6) and the deep N-well (3) through a heavy-doping N-well area (5), a shallow trench isolation area (7) is located between the P-well area (2) and the N-well area (6) to isolate a P-well from an N-well, a P-type doped protection ring (8) surrounds the shallow trench isolation area (7) so as to restrain dark noise caused by defects in shallow trench isolation, and a PN junction (11) is arranged between the bottom of the P-well area (2) and the deep N-well (3); the PN junction generates a high-voltage area when proper bias voltage is applied between the cathode and the anode, and an SPAD multiplication area is formed so as to explore photons; the breakdown voltage of the edge of the PN junction is higher than that of the SPAD plane multiplication area by controlling the concentration gradient of the deep N-well (3).
Owner:苏州超锐微电子有限公司

Method and device for protecting silicon wafer edge

The present invention provides method and device for protecting silicon wafer edge, wherein the method comprises the following steps: placing a protection ring on a working bench by a device for protecting silicon wafer; protecting the silicon wafer edge by the protection ring during exposure of the silicon wafer; performing said flows again after replacing a new silicon wafer, wherein the centreof the protection ring is a hollow part, and the edge thereof is an entity part; the protection ring prevents the silicon wafer edge from exposing during exposure. The method for protecting silicon wafer edge comprises a position adjusting mechanism, a Z-direction lifting gear, three eccentric linkage overload protection cam-reciprocating pneumatic swing-cylinder connecting rod mechanisms, a blowing mechanism, a detection mechanism, a speed control module, and a pneumatic control module. In the method and device for protecting silicon wafer edge of the present invention, the method is that negative glue exposure and the edge protection are performed synchronously; when the silicon wafer is exposed, the silicon wafer edge is protected without a second process for processing the silicon wafer edge; the processes are reduced, and working efficiency is improved.
Owner:SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD

Method for preparing hollow steel ingot for protection ring of large power generator by adopting electroslag remelting

The invention discloses a method for preparing a hollow steel ingot for a protection ring of a large power generator by adopting electroslag remelting. The method comprises the following steps: (1) preparing consumable electrode groups; (2) melting slag into liquid molten slag; (3) inserting the consumable electrode groups into an electroslag remelting hollow ingot crystallizer; (4) starting two transformers; (5) injecting the liquid molten slag into the electroslag remelting hollow ingot crystallizer; (6) when the consumable electrode groups are in contact with the liquid molten slag, forming an electrifying loop among fake electrodes, the consumable electrode groups and a bottom water tank; (7) when the liquid molten slag is in contact with an upper section, forming a loop among the upper section, the bottom water tank and the transformers connected with the bottom water tank; (8) adjusting the output currents and voltages of the two transformers; (9) when a metal melt is in contact with a molten steel liquid level detection device, starting an ingot stripping device for ingot stripping; (10) exchanging the consumable electrode groups; and (11) inserting subsequent consumable electrode groups into the liquid molten slag, and repeating the steps (8 to 10) until the ingot stripping is finished.
Owner:NORTHEASTERN UNIV LIAONING

A deep ditch groove high-power MOS device and the corresponding manufacturing method

The invention relates to a deep trench high-power MOS device and the manufacturing method. The MOS device is arranged on an overlooking plane, a central area is provided with an array which consists of parallel connected single cells, the periphery of the single-cell array is provided with a terminal protection structure, the terminal protection structure consists of at least one protection ring which is arranged at an inner ring and a stop ring which is positioned at an outer ring; as both the protection ring and the stop ring adopt trench type conductive polysilicon, and a single-cell grid electrode lead wire adopts the method of directly opening a hole to lead the wire on the trench type conductive polysilicon in the manufacturing process of the device; compared with the manufacturing method of existing common plane type deep trench high-power MOS device with a field-plate structure, the invention can reduce two lithographys and corresponding processes under the premise of not affecting the performances of the device, thus greatly reducing manufacturing cost. At the same time, the invention adopts one time phosphorus injection, then one time boron injection and matching annealing processes are adopted to regulate the conductive polysilicon resistance, thereby greatly reducing the leakage current between a grid and a source and ensuring to obtain a reasonable threshold voltage under the premise of not increasing the concentration of an N-well.
Owner:SUZHOU SILIKRON SEMICON CO LTD

Intelligent flight device with obstacle avoiding function for bridge detection

The invention relates to an intelligent flight device with an obstacle avoiding function for bridge detection. The device comprises a body, a protection ring, a detection mechanism, a connecting mechanism, a buffer mechanism and four flight mechanisms; the detection mechanism comprises a camera, a connecting block, a stretchable assembly and an adjusting assembly; the stretchable assembly comprises an air pump, a cylinder, a piston and two hinge units; the buffer mechanism comprises a plurality of buffer assemblies; each buffer assembly comprises a sleeve, a first spring, an ejector rod and asteel ball; the connecting mechanism comprises a plurality of connecting assemblies; each connecting assembly comprises a second spring, a pressure plate and a connecting rod. According to the intelligent flight device with the obstacle avoiding function for bridge detection, the camera is moved and rotated through the detection mechanism, the camera can perform photographing at different angles and directions, and photographing blind spots are avoided; due to the buffer mechanism and the protection ring, the phenomenon that the body collides with a bridge and piers during flying is avoided, safety flight of the device is ensured, and therefore the practicability of the device is improved.
Owner:NANJING AITASI INTELLIGENT TECH CO LTD

Manufacturing method of flat-type avalanche diode detector used for detecting single photon

The invention relates to a manufacturing method of a flat-type avalanche diode detector used for detecting a single photon. The manufacturing method comprises the following steps: sequentially growing an InP buffer layer, an InGaAs absorbing layer, an InGaAsP gradient layer, an N-type InP charge layer and an InP cap layer on an N-type InP substrate; growing an SiO2 protective layer on the InP caplayer; photoengraving a round window at the middle of the SiO2 protective layer; eroding the InP cap layer in the round window through wet-method erosion, thereby forming a round hole; carving a protection ring window on the SiO2 protective layer around the round window; removing surplus SiO2 protective layer by utilizing an HF (hydrogen fluoride) solution in the protection ring window through a diffusion process; regrowing the InP cap layer an SiO2 layer, and caving an electrode window at the periphery of the round hole; forming a top ring electrode on the electrode window through an electron beam evaporation and desquamation process, and preparing a metal electrode at the periphery and one side of the ring electrode; and forming a back electrode at the back of the N-type InP substrate through electron beam evaporation, and preparing a SiNx antireflection layer at the surface of the InP cap layer in the round hole, thereby finishing the manufacture of the avalanche diode detector.
Owner:INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI

Silicon-based near-infrared single photon avalanche diode detector and manufacturing method thereof

The invention discloses a silicon-based near-infrared single photon avalanche diode detector, and belongs to the technical field of photoelectric detection. The single photon avalanche diode detectorcomprises a P-type epitaxial layer arranged above a P-type substrate, wherein the P-type substrate and the P-type epitaxial layer are provided with an N+ buried layer region therebetween, deep P wellregions are symmetrically arranged on the N+ buried layer region, a deep P well region is arranged on the N+ buried layer region at the central position, and an avalanche region is formed between thedeep P well region and the N+ buried layer region. According to the single photon avalanche diode detector, the deep avalanche region is formed between the deep P well and the N+ buried layer, the lightly-doped and uniformly distributed P-type epitaxial layer is utilized as a virtual protection ring at the same time to improve the near-infrared photon detection efficiency, the size of the device is reduced, and the dark counting noise is reduced. The manufacturing method can carry out manufacturing based on the standard silicon-based process, and has the advantages of low cost, high integration, low power consumption, near-infrared detection capability and the like.
Owner:NANJING UNIV OF POSTS & TELECOMM

Silicon chip edge protection device and application method thereof

The invention discloses a silicon chip edge protection device and an application method thereof. A cylinder, one end of which is arranged on a fixed disc and the other end of which is arranged on a three-eccentric cam disc, horizontally stretches and swings to drive the three-eccentric cam disc arranged on the fixed disc to perform circular motion; by a method of converting a linear motion into aplurality of equal synchronous radial motions in a vector conversion form, the linear swing is converted into the circular motion; the three-eccentric cam disc drives eccentric grooves on the cam disc to perform circular motion around respective circle center, so that a circular motion is converted a plurality of synchronous eccentric motions; the three-eccentric cam disc drives cams in the eccentric grooves to perform radial motion, so that the plurality of synchronous eccentric motions are converted into synchronous radial motions; and cam followers drive protection claws to perform radial motion, and the protection claws grip or lay down protection rings, so that exchange of the protection rings or other articles is realized. The device has high precision, good reliability, high repeated precision, simple structure, low need of power source and high synchronism.
Owner:SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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