A kind of antistatic self-restoring triple interpenetrating network silicon hydrogel and preparation method thereof
A silicon hydrogel and interpenetrating network technology, which is applied in the field of antistatic self-recovery triple interpenetrating network silicon hydrogel and its preparation, can solve the problem of not being able to have mechanical and mechanical properties, self-recovery properties and antistatic properties at the same time. The polymer is easy to accumulate static electricity and the preparation process is complicated, so as to achieve the effects of excellent self-recovery performance, excellent antistatic performance and excellent anti-fatigue performance
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Embodiment 1
[0041] A preparation method of antistatic self-restoring triple interpenetrating network silicon hydrogel, comprising the following steps:
[0042] 1) Add 24mL deionized water to a 100mL beaker, add 3.75g acrylamide AM, 0.47g acrylic acid AA, 2g cetyltrimethylammonium bromide and 0.31g octadecyl methacrylate, at a certain temperature Stir to make it dissolve, and then add 2mL of ethanol, 1g of hexamethyldisiloxane, 3.25g of ethyl orthosilicate and 3mL of concentrated hydrochloric acid in sequence after stirring evenly, and continue stirring. Dissolve 20 mg of potassium persulfate in 1 mL of deionized water and add it to the above solution, then transfer the above prepared solution to a self-made glass mold, and polymerize at 70 °C for 24 hours to obtain a double network silicone hydrogel HPAMAA -Si 3MQ Dumbbell-shaped spline (3 represents the amount of hydrochloric acid added, M and Q refer to hexamethyldisiloxane and tetraethylorthosilicate, respectively).
[0043] 2) Take ...
Embodiment 2
[0050] A preparation method of antistatic self-restoring triple interpenetrating network silicon hydrogel, comprising the following steps:
[0051] 1) Add 24mL deionized water to a 100mL beaker, add 3.75g acrylamide AM, 0.47g acrylic acid AA, 2g cetyltrimethylammonium bromide and 0.31g octadecyl methacrylate, at a certain temperature Stir to dissolve. After stirring evenly, add 2 mL of ethanol, 1 g of hexamethyldisiloxane, 3.25 g of ethyl orthosilicate and 3 mL of concentrated hydrochloric acid in sequence, and continue stirring. Dissolve 20 mg of potassium persulfate in 1 mL of deionized water and add to the above solution. Transfer the above-prepared solution to a self-made glass mold, and polymerize at 70°C for 24 hours to obtain a double-network silicon hydrogel HPAMAA-Si 3MQ Dumbbell-shaped spline (3 represents the amount of hydrochloric acid added, M and Q refer to hexamethyldisiloxane and tetraethylorthosilicate, respectively).
[0052] 2) Take 4 mL of 50% phytic aci...
Embodiment 3
[0061] A preparation method of antistatic self-restoring triple interpenetrating network silicon hydrogel, comprising the following steps:
[0062] 1) Add 24mL deionized water to a 100mL beaker, add 3.75g acrylamide AM, 0.47g acrylic acid AA, 2g cetyltrimethylammonium bromide and 0.31g octadecyl methacrylate, at a certain temperature Stir to dissolve. After stirring evenly, add 2 mL of ethanol, 1 g of hexamethyldisiloxane, 3.25 g of ethyl orthosilicate and 3 mL of concentrated hydrochloric acid in sequence, and continue stirring. Dissolve 20 mg of potassium persulfate in 1 mL of deionized water and add to the above solution. Transfer the above-prepared solution to a self-made glass mold and polymerize at 70°C for 24 hours to obtain a hydrophobic silicon hydrogel HPAMAA-Si 3MQ Dumbbell-shaped spline (3 represents the amount of hydrochloric acid added, M and Q refer to hexamethyldisiloxane and tetraethylorthosilicate, respectively).
[0063] 2) Take 4 mL of 50% phytic acid aq...
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