Method for generating sketch to bas relief model based on generative adversarial network

A bas-relief and network technology, applied in the field of generation of sketches to bas-relief models based on generative confrontation networks, can solve problems such as inability to obtain relief models and limit creators' imagination, achieve good visual effects, and release creative space.
CN110766786AInactive Publication Date: 2020-02-07HUNAN UNIV
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Patent Information

Authority / Receiving Office
CN · China
Current Assignee / Owner
HUNAN UNIV
Publication Date
2020-02-07
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention discloses a method for generating a sketch to bas-relief model based on a generative adversarial network. The method comprises the following steps: model design: designing a reasonable network model based on a generative adversarial network structure; acquiring a data set; acquiring the corresponding sketch and the corresponding bas-relief model for the three-dimensional model at different visual angles, extracting and storing the height field of the obtained bas-relief model as a picture, and establishing a sketch-relief data set; model training: inputting the established data set into a designed model for training, and optimizing the parameters of the generation network and the discrimination network; and user testing: performing feature extraction on the sketch input by the user to generate a height field of the bas-relief model corresponding to network output, and then restoring the generated height field into the bas-relief model. According to the method, the generative adversarial network structure is used, and the corresponding bas-relief model can be generated according to the hand-drawn sketch of the user, and the obtained bas-relief model has a good visual effect.
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Description

technical field

[0001] The invention relates to the field of picture generation, in particular to a method for generating a sketch-to-bas-relief model based on a generation confrontation network. Background technique

[0002] Relief is an ancient and mature art form. The sculptor carves the image he wants to shape on a flat plate to make it out of the plane of the original material. Relief modeling has also been widely introduced into the field of computer graphics. According to the thickness, it mainly includes three types: high relief, concave relief and shallow relief (that is, shallow relief). Creating bas-reliefs by hand is a cumbersome and inefficient process as it relies entirely on the artist's three-dimensional imagination and skill. In the last ten years of development, great progress has been made by converting 3D models into digital reliefs. Although digital relief can be quickly obtained by computer, it is necessary to input the pre-corresponding 3D model whe...

Claims

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