Precursor level sensor

Abstract

An apparatus for the detecting the amount of material remaining in a container is disclosed. This apparatus may be beneficial when used with a semiconductor processing device, especially when the material is in the solid phase. The apparatus measures the impedance between an electrode disposed in the container, and the outside of the container to make a determination regarding how full the container may be. In certain embodiments, only the magnitude of the impedance is used for this calculation. In other embodiments, the magnitude and phase of the impedance are used. This may be used to determine the topology of the material within the container.

Description

technical field [0001] Embodiments relate to an apparatus for determining the amount of precursor remaining in a container, and more particularly, to the amount of solid precursor remaining in an ampoule. Background technique [0002] Semiconductors are fabricated by subjecting workpieces to multiple processing steps. Some of these processes include deposition, etching and ion implantation. In order to perform ion implantation, dopant materials may be used. Such dopant materials may be in gaseous, liquid or solid form. To perform an etching process, an etching material may be used. Similarly, suitable materials can be used for the deposition process. Thus, in all of these processes, there may be a material of interest, which may be a gas, liquid or solid. The material of interest is often stored in containers such as ampoules. [0003] While a process is being performed, it may be beneficial to monitor the amount of material of interest. For example, if the material o...

AI Technical Summary

Problems solved by technology

Because the carrier gas flows into the container and the gaseous material flows out of the container, it is very difficult to accurately measure the flow rate of the material of interest

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