Novel HIT and EB material matched organic light-emitting device
An electroluminescent device and electroluminescent technology, applied in the field of semiconductors, can solve the problems of large HOMO energy level difference, affecting device performance, affecting device life, etc.
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- Publication Date
- 2021-03-12
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Abstract
Description
technical field
[0001] The invention relates to the technical field of semiconductors, in particular to a novel organic electroluminescent device with a combination of HIT and EB materials and a display comprising the same. Background technique
[0002] Organic electroluminescence (OLED: Organic Light Emitting Diodes) device technology can be used to manufacture new display products, and can also be used to make new lighting products. It is expected to replace the existing liquid crystal display and fluorescent lighting, and has a wide application prospect. Typically, an OLED is composed of several layers including a positive electrode, a negative electrode, a hole injection layer, a hole transport layer, an organic light emitting layer, an electron transport layer, and an electron injection layer. OLED light-emitting device is a current device. When a voltage is applied to the electrodes at its two ends, and the positive and negative charges in the organic layer functional ...
Examples
preparation Embodiment 1
[0109] Hole injection layer 1: Use the OLED Chuster Deposition System (manufacturer: CHOSHU INDUSTRY Co.LTD.) evaporation equipment of model 1504-10117-01-0 to place the hole transport host material HI1 and the P-type dopant material P1 on the Two evaporation sources, at a vacuum degree of 1.0E -5 Under Pa pressure, control the evaporation rate of HIT1 as Control the evaporation rate of P-type dopant material 1 as Co-distilled together to obtain HI1 of the present invention.
[0110] Hole injection layer 2: repeat the preparation process of hole injection layer preparation example 1, the difference is that HIT1 is replaced by HIT3 to obtain HI2.
[0111] Hole injection layer 3: Repeat the preparation process of hole injection layer preparation example 1, except that HIT1 is replaced by HIT11 to obtain HI3.
[0112] Hole injection layer 4: Repeat the preparation process of hole injection layer preparation example 1, except that HIT1 is replaced by HIT15 to obtain HI4.
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