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Apparatus for treating substrates

A substrate processing and substrate technology, used in optics, instruments, electrical components, etc., can solve problems such as poor uniformity of cleaning and drying processes

Inactive Publication Date: 2006-01-04
SAMSUNG DISPLAY CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] However, as the size of the substrate increases, the uniformity of the cleaning and drying process will become less and less

Method used

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  • Apparatus for treating substrates
  • Apparatus for treating substrates
  • Apparatus for treating substrates

Examples

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Embodiment Construction

[0028] Reference will now be made in detail to embodiments of the present invention, such as illustrated in the accompanying drawings, wherein like reference numerals refer to like elements throughout. In order to explain the present invention, the embodiments will be described below with reference to the figures.

[0029] The substrate processing apparatus according to the first embodiment of the present invention will incorporate figure 1 and figure 2 to describe.

[0030] figure 1 is a cross-sectional view of the substrate processing apparatus 1 according to the first embodiment of the present invention, and figure 2 is a perspective view of a cleaning assembly according to a first embodiment of the present invention.

[0031] The substrate processing apparatus 1 includes an etching unit 200, a cleaning unit 300, a drying unit 400, and a moving mechanism 500 for moving the substrate 100 to be processed.

[0032] In the etching assembly 200, the portion of the metal l...

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PUM

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Abstract

An apparatus for treating substrate comprising, a moving mechanism for moving a substrate and a high pressure spray unit comprising a first high pressure spray having a first nozzle portion disposing transverse to the direction of movement of the substrate and a second high pressure spray having a second nozzle portion parallel to the first nozzle portion.

Description

technical field [0001] The present invention relates to an apparatus for processing a substrate, and more particularly, to a substrate processing apparatus for cleaning and / or drying a substrate by supplying a processing liquid to the substrate. Background technique [0002] A liquid crystal display (LCD) includes a liquid crystal panel including a thin film transistor (TFT) substrate, a color filter substrate, and a liquid crystal layer sandwiched between the two substrates. Since the liquid crystal panel itself does not emit light, a backlight unit may be located behind the TFT substrate to provide light to the liquid crystal panel. The transmittance of light emitted by the backlight unit depends on the orientation of the liquid crystal layer. [0003] In addition, the LCD may further include: a driving circuit for driving the pixels of the liquid crystal panel, a data driver and a gate driver, wherein the data driver and the gate driver receive driving signals from the d...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/1333
CPCG02F1/13G02F2201/54H01L21/67051H01L21/6776
Inventor 李荣植
Owner SAMSUNG DISPLAY CO LTD