Method for analyzing and/or processing an object as well as a particle beam device for carrying out the method
a particle beam and object technology, applied in the direction of basic electric elements, electric discharge tubes, electrical apparatus, etc., can solve the problems of not being able to determine the value of errors, not being able to accurately position objects and/or guiding, and not being able to analyze and/or process wrong areas, etc., to avoid the effect of analyzing and/or processing the wrong area
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[0049]FIG. 1 shows a schematic illustration of one embodiment of a particle beam device 1 according to the system described herein. The particle beam device 1 has a first particle beam column 2 in the form of an ion beam column, and a second particle beam column 3 in the form of an electron beam column. The first particle beam column 2 and the second particle beam column 3 are arranged on a sample chamber 100, in which a sample 16 to be analyzed and / or processed is arranged. It is explicitly noted that the system described herein is not restricted to the first particle beam column 2 being in the form of an ion beam column and the second particle beam column 3 being in the form of an electron beam column. In fact, the system described herein also provides for the first particle beam column 2 to be in the form of an electron beam column and for the second particle beam column 3 to be in the form of an ion beam column. A further embodiment of the system described herein provides for bo...
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