Semiconductor light-emitting device and method of manufacturing same
A light-emitting element and manufacturing method technology, which is applied in the direction of semiconductor devices, electrical components, circuits, etc., can solve the problems of reduced light transmittance, reduced luminous efficiency of the light-emitting layer, light absorption, etc., and achieve the effect of reducing attenuation
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no. 1 example
[0088] Figure 8 A schematic cross-sectional view showing a semiconductor light emitting element according to a first embodiment of the present invention.
[0089] The above-mentioned semiconductor light emitting element has a quaternary AlGaInP light emitting layer 5 having a red light emitting wavelength. This AlGaInP light emitting layer 5 is an example of a light emitting layer.
[0090] In addition, the above semiconductor light emitting element has n-type Al on the upper side of the AlGaInP light emitting layer 5 in the figure. 0.6 Ga 0.4 As current diffusion layer (hereinafter referred to as n-type AlGaAs current diffusion layer) 3 and n-type Al 0.5 In 0.5 P cladding layer (hereinafter referred to as n-type AlInP cladding layer) 4 . The n-type AlGaAs current diffusion layer 3 and the n-type AlInP cladding layer 4 are examples of first conductivity type semiconductor layers.
[0091] In addition, the above-mentioned semiconductor light emitting element has p-type A...
no. 2 example
[0115] Figure 9 is a schematic cross-sectional view of a semiconductor light emitting element according to a second embodiment of the present invention. Figure 9 In, for by and Figure 8 Constituents of the same material composition as those shown in the first embodiment with the addition of Figure 8 Components with the same reference numerals.
[0116] The difference between the above-mentioned semiconductor light-emitting element and the above-mentioned first embodiment is that the carrier concentration of the p-type GaP light-transmitting substrate 9 is lower than 5.0×10 17 cm -3 And a metal layer 21 is formed between the p-type GaP light-transmitting substrate 9 and the p-type GaP contact layer 8 .
[0117] In the case of manufacturing the aforementioned semiconductor light emitting element, although the aforementioned wafer 20 is prepared as in the aforementioned first embodiment, it is not necessary to form half-cut grooves on the wafer 20 in advance.
[0118] Th...
no. 3 example
[0124] Figure 10 is a schematic cross-sectional view of a semiconductor light emitting element according to a third embodiment of the present invention. Figure 10 In, for by and Figure 8 components of the same material composition as shown in the first embodiment with the addition of Figure 8 Components with the same reference numerals.
[0125] The above-mentioned semiconductor light-emitting element is different from the above-mentioned first embodiment in that it has a light-transmitting substrate 31 made of an insulator. As an insulator material, Al can be used 2 o 3 , SiO 2 , glass or insulating semiconductor SiC, GaP, ZnO, TiO 2 , SnO 2 Wait.
[0126] The light-transmitting substrate 31 transmits light from the AlGaInP light-emitting layer 5 . That is, the translucent substrate 31 is made of an insulating material transparent to the emission wavelength of the AlGaInP light emitting layer 5 . In addition, the above-mentioned translucent substrate 31 is an ex...
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