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Semiconductor light-emitting device and method of manufacturing same

A light-emitting element and manufacturing method technology, which is applied in the direction of semiconductor devices, electrical components, circuits, etc., can solve the problems of reduced light transmittance, reduced luminous efficiency of the light-emitting layer, light absorption, etc., and achieve the effect of reducing attenuation

Inactive Publication Date: 2008-10-29
SHARP KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0017] Moreover, when the carrier concentration of the above-mentioned transparent substrate is increased, of course, the density of impurities or defects in the transparent substrate will increase, and light will be absorbed or attenuated due to these impurities or defects.
[0018] In addition, in the method of pasting the above-mentioned transparent substrate on the epitaxial layer, heat treatment is performed to paste the transparent substrate on the epitaxial layer, but since the temperature of this heat treatment is very high, atoms as dopants Diffusion, so that atoms as dopants segregate to the paste interface, crystal interface, light-emitting layer, etc.
[0019] In the case where the atoms serving as the dopant segregate to the pasting interface or the crystal interface, or cause a decrease in light transmittance in the pasting interface or the crystal interface, in addition, when the atoms serving as the dopant segregate to the light-emitting layer, will lead to a decrease in the luminous efficiency of the light-emitting layer
[0020] In addition, in the case where a metal layer is provided on the pasting interface for the purpose of reducing the resistance of the pasting interface, the metal layer itself does not transmit ordinary light, and in order to make the contact between the metal and the crystal When the interface contact is good and heat treatment is performed, the alloy layer at the interface (blackening phenomenon) becomes a light absorbing layer, and as a result, the external light export rate does not improve as expected

Method used

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  • Semiconductor light-emitting device and method of manufacturing same
  • Semiconductor light-emitting device and method of manufacturing same
  • Semiconductor light-emitting device and method of manufacturing same

Examples

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no. 1 example

[0088] Figure 8 A schematic cross-sectional view showing a semiconductor light emitting element according to a first embodiment of the present invention.

[0089] The above-mentioned semiconductor light emitting element has a quaternary AlGaInP light emitting layer 5 having a red light emitting wavelength. This AlGaInP light emitting layer 5 is an example of a light emitting layer.

[0090] In addition, the above semiconductor light emitting element has n-type Al on the upper side of the AlGaInP light emitting layer 5 in the figure. 0.6 Ga 0.4 As current diffusion layer (hereinafter referred to as n-type AlGaAs current diffusion layer) 3 and n-type Al 0.5 In 0.5 P cladding layer (hereinafter referred to as n-type AlInP cladding layer) 4 . The n-type AlGaAs current diffusion layer 3 and the n-type AlInP cladding layer 4 are examples of first conductivity type semiconductor layers.

[0091] In addition, the above-mentioned semiconductor light emitting element has p-type A...

no. 2 example

[0115] Figure 9 is a schematic cross-sectional view of a semiconductor light emitting element according to a second embodiment of the present invention. Figure 9 In, for by and Figure 8 Constituents of the same material composition as those shown in the first embodiment with the addition of Figure 8 Components with the same reference numerals.

[0116] The difference between the above-mentioned semiconductor light-emitting element and the above-mentioned first embodiment is that the carrier concentration of the p-type GaP light-transmitting substrate 9 is lower than 5.0×10 17 cm -3 And a metal layer 21 is formed between the p-type GaP light-transmitting substrate 9 and the p-type GaP contact layer 8 .

[0117] In the case of manufacturing the aforementioned semiconductor light emitting element, although the aforementioned wafer 20 is prepared as in the aforementioned first embodiment, it is not necessary to form half-cut grooves on the wafer 20 in advance.

[0118] Th...

no. 3 example

[0124] Figure 10 is a schematic cross-sectional view of a semiconductor light emitting element according to a third embodiment of the present invention. Figure 10 In, for by and Figure 8 components of the same material composition as shown in the first embodiment with the addition of Figure 8 Components with the same reference numerals.

[0125] The above-mentioned semiconductor light-emitting element is different from the above-mentioned first embodiment in that it has a light-transmitting substrate 31 made of an insulator. As an insulator material, Al can be used 2 o 3 , SiO 2 , glass or insulating semiconductor SiC, GaP, ZnO, TiO 2 , SnO 2 Wait.

[0126] The light-transmitting substrate 31 transmits light from the AlGaInP light-emitting layer 5 . That is, the translucent substrate 31 is made of an insulating material transparent to the emission wavelength of the AlGaInP light emitting layer 5 . In addition, the above-mentioned translucent substrate 31 is an ex...

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PUM

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Abstract

A semiconductor light-emitting device has a first conductivity type semiconductor layer (3, 4), a luminous layer (5) formed on the first conductivity type semiconductor layer, a second conductivity type semiconductor layer (8) formed on the luminous layer, and a transmissive substrate (9) which is formed on the second conductivity type semiconductor layer (8) and is pervious to light coming from the luminous layer (5). The transmissive substrate (9) has a carrier concentration lower than that of the second conductivity type semiconductor layer (8).

Description

technical field [0001] The present invention relates to, for example, communication devices; road, line, and signage display board devices; advertising display devices; mobile phones; display backlights; Background technique [0002] In recent years, due to the rapid progress in the manufacturing technology of semiconductor light-emitting diodes (hereinafter referred to as "LEDs") as a kind of semiconductor light-emitting element, especially after the blue LED is emitted, the LEDs of the three primary colors of light have been gathered, so by combining this LEDs of three primary colors can produce light of all wavelengths. As a result, the range of application of LEDs has rapidly expanded. Among them, in the field of lighting, as awareness of environmental and energy issues has increased, LEDs have attracted attention as natural light and white light sources that replace light bulbs and fluorescent lamps. [0003] However, compared with light bulbs or fluorescent lamps, exi...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L33/00H01L33/02
Inventor 渡边信幸井口缘村上哲朗
Owner SHARP KK