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Immersion lithography systems

A technology of lithography and sealing ring, which is applied in the direction of microlithography exposure equipment, electrical components, semiconductor/solid-state device manufacturing, etc., which can solve the problems of inconvenience and general product without structure

Active Publication Date: 2009-05-20
TAIWAN SEMICON MFG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] It can be seen that the above-mentioned existing immersion lithography system obviously still has inconvenience and defects in structure and use, and needs to be further improved urgently.
In order to solve the above-mentioned problems, the relevant manufacturers have tried their best to find a solution, but no suitable design has been developed for a long time, and the general products do not have a suitable structure to solve the above-mentioned problems. This is obviously related. The problem that the industry is eager to solve

Method used

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Embodiment Construction

[0096] In order to further explain the technical means and effects of the present invention to achieve the intended purpose of the invention, the specific implementation, structure, characteristics and effects of the immersion lithography system proposed according to the present invention will be described below in conjunction with the accompanying drawings and preferred embodiments. , as detailed below.

[0097] The present invention provides an improved system and method for sealing and controlling the immersion fluid in the immersion area throughout the immersion lithography process. The disclosed seal ring arrangement has a seal ring arrangement to help seal and contain the wetting fluid from the wafer substrate and the wetting fluid reservoir by covering the edge of the wafer substrate. The disclosed seal ring is installed and removed from the working position through the use of the disclosed grommet carrier. The present invention provides several examples of how immersi...

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Abstract

The invention relates to a immersion lithography system, at least comprising: a wafer chuck for containing and processing a wafer on it by immersion lithography; at least a seal ring for sealing the wafer on the wafer chuck; a seal ring carrier for loading the seal ring to the wafer chuck, or offloading the seal ring from the wafer chuck; and a vacuum modules for absorbing the seal ring to the wafer and the wafer chuck. Recuring to arranged structure of these seal rings, the immersion lithography system provides better seal effect and processes wafer on the wafer chuck.

Description

technical field [0001] The invention relates to an immersion lithography system for manufacturing semiconductor devices, in particular to a sealing ring carrier of the immersion lithography system. Background technique [0002] The fabrication of very large scale integration (VLSI) circuits uses many photolithography process steps to define and create specific circuits and components on the surface of a semiconductor wafer (substrate). The existing known optical lithography system includes several basic subsystems: light source, light transmission element, photo mask (Photo Mask Reticles) and electronic controller. These systems are used to project a specific circuit pattern defined by a photomask onto a semiconductor wafer coated with a photoresist film. As VLSI technology advances, circuits become smaller and denser in geometry and require the use of lithography equipment with less resolution projection and printing capabilities. These devices need to have a resolving po...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20H01L21/027
Inventor 林本坚高蔡胜陈俊光刘如淦游信胜施仁杰
Owner TAIWAN SEMICON MFG CO LTD