Computer-implemented methods for determining if actual defects are potentially systematic defects or potentially random defects

一种系统性、计算机的技术,应用在计算机辅助设计、计算、仪器等方向,能够解决低劣设计、错误结果、小设计规则等问题

Active Publication Date: 2010-07-21
KLA CORP
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Furthermore, with minor design rules, process-induced failures may in some cases tend to be systematic
That is, process-induced failures tend to fail in predetermined design patterns that are typically repeated many times within the design
Additionally, while defects are generally process and design interrelated, process-induced failures are defects that arise from process variation phenomena that are not necessarily due to poor design
Therefore, these previously used methods may produce erroneous results by identifying groups of random defects as potentially systematic defects
Additionally, methods based on Pareto chart cut-lines may not be effective for determining which defect bins contain potentially systematic defects, since all defects on a given wafer are assumed to be random defects (i.e., assuming 0% systematic), the defect counts shown in the Pareto chart illustrating the results of grouping by design may only report the relative area of ​​the different circuit structures on that wafer

Method used

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  • Computer-implemented methods for determining if actual defects are potentially systematic defects or potentially random defects
  • Computer-implemented methods for determining if actual defects are potentially systematic defects or potentially random defects
  • Computer-implemented methods for determining if actual defects are potentially systematic defects or potentially random defects

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Embodiment Construction

[0036] As used herein, the term "actual defect" refers to an actual defect detected on a wafer. Thus, the term "actual defect" does not refer to actual defects that may be present on a wafer but have not been detected on that wafer.

[0037] The term "wafer" as used herein generally refers to a substrate formed of semiconducting or non-semiconducting materials. Examples of such semiconductor or non-semiconductor materials include, but are not limited to, single crystal silicon, gallium arsenide, and indium phosphide. Such substrates are typically found and / or handled in semiconductor fabrication facilities.

[0038] A wafer may include one or more layers formed on a substrate. For example, such layers may include, but are not limited to, a resist, a dielectric material, a conductive material, and a semiconductor material. Many different types of such layers are known in the art, and the term wafer as used herein is intended to encompass all types of wafers including such la...

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PUM

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Abstract

Various computer-implemented methods for determining if actual defects are potentially systematic defects or potentially random defects are provided. One computer-implemented method for determining if actual defects are potentially systematic defects or potentially random defects includes comparing a number of actual defects in a group to a number of randomly generated defects in a group. The actual defects are detected on a wafer. A portion of a design on the wafer proximate a location of each of the actual defects in the group and each of the randomly generated defects in the group is substantially the same. The method also includes determining if the actual defects in the group are potentially systematic defects or potentially random defects based on results of the comparing step.

Description

technical field [0001] The present invention relates generally to a computer-implemented method of determining whether an actual defect is a potential systematic defect or a potentially random defect. Certain embodiments relate to determining whether an actual defect is a potential systematic defect or a potential random defect by comparing the actual defects grouped by design with the randomly generated defects grouped by design. Background technique [0002] The following description and examples are not admitted to be prior art by virtue of their inclusion in this section. [0003] Integrated circuit (IC) designs may be developed using methods or systems such as electronic design automation (EDA), computer aided design (CAD), and other IC design software. Such methods and systems can also be used to generate circuit pattern databases from IC designs. The circuit pattern database includes data representing multiple layouts for the various layers of the IC. The data in t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G06F17/50
CPCG01R31/318371G01R31/318314G06F17/5081G06F30/398
Inventor 葛林恩·佛罗伦斯艾伦·派克彼得·罗斯
Owner KLA CORP
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