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Deposition apparatus for improving the uniformity of material processed over a substrate and method of using the apparatus

A deposition device and substrate technology, applied in sustainable manufacturing/processing, climate sustainability, final product manufacturing, etc., can solve problems such as energy wave reflection, electric field disturbance, etc.

Inactive Publication Date: 2011-08-10
UNITED SOLAR OVONIC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The electric field generated around the electrodes may be perturbed for various reasons, for example due to the reflection of energy waves from the boundary conditions of the electrodes

Method used

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  • Deposition apparatus for improving the uniformity of material processed over a substrate and method of using the apparatus
  • Deposition apparatus for improving the uniformity of material processed over a substrate and method of using the apparatus
  • Deposition apparatus for improving the uniformity of material processed over a substrate and method of using the apparatus

Examples

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Embodiment Construction

[0030] Disclosed herein is an exemplary embodiment of a deposition apparatus configured to enhance the uniformity of an electric field formed around an electrode in a region between the electrode and a substrate spaced from the electrode to help process material uniformly over the substrate. Embodiments of the device include various configurations of structures connected to the electrodes and electrically connected to the energy source. Exemplary embodiments of structures disclosed herein are configured to electrically connect energy from an energy source through and around the structure to electrodes in a manner for forming a substantially uniform electric field around the electrodes in the vicinity of one or more substrates.

[0031] Exemplary embodiments of the deposition apparatus disclosed herein are not limited to horizontal or vertical orientations, or parallel plate configurations. The configuration of the deposition apparatus will be tailored to the particular semicon...

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PUM

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Abstract

Deposition apparatus for uniformly forming material on a substrate in accordance with an exemplary embodiment is provided. The deposition apparatus includes an energy source, an electrode in a facing, spaced relationship with respect to the substrate, and interface structure joined to the electrode. The interface structure is configured to electrically couple energy from the energy source through and about the interface structure to the electrode for formation of a substantially uniform electric field between the electrode and a predetermined area of the substrate when the interface structure is supplied with energy from the energy source.

Description

technical field [0001] government interest [0002] This invention was made at least in part under Contract No. DE-FC36-07G017053, US Government Department of Energy. So the U.S. government can have certain rights and interests in this invention. [0003] The present invention generally relates to processing materials on substrates. In particular, the present invention relates to an apparatus for generating material on a substrate, the apparatus being configured for forming a substantially uniform electric field on the substrate, wherein the material activated within the uniform electric field is processed in a substantially uniform manner on the substrate. Background technique [0004] Deposition devices have been widely used in the fabrication of semiconductor devices, such as photoresponsive devices, thin film transistors, integrated circuits, device arrays, displays, and the like. [0005] In many applications, the deposition apparatus includes a chamber in which are ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/205
CPCH01J37/32091H01J37/32009H01J37/32577Y02E10/50H01L31/206Y02P70/50
Inventor Y·李S·琼斯V·肯尼拉A·库马J·德勒K·尤南
Owner UNITED SOLAR OVONIC
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