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Rhodococcus and method for degrading and decoloring triphenylmethane dyes by utilizing rhodococcus

A technology of triphenylmethane and Rhodococcus, which is applied in the directions of microorganism-based methods, biochemical equipment and methods, bacteria, etc., can solve the problems that the application of Rhodococcus has not yet been reported.

Active Publication Date: 2012-08-01
JIANGNAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] However, there is no report on the application of Rhodococcus in the degradation and decolorization of triphenylmethane dyes.

Method used

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  • Rhodococcus and method for degrading and decoloring triphenylmethane dyes by utilizing rhodococcus
  • Rhodococcus and method for degrading and decoloring triphenylmethane dyes by utilizing rhodococcus
  • Rhodococcus and method for degrading and decoloring triphenylmethane dyes by utilizing rhodococcus

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Embodiment 1

[0029] Embodiment 1 Rhodococcus ( Rhodococcus sp.) JB301 screening isolation and identification

[0030] 1. Rhodococcus ( Rhodococcus sp.) JB301 was isolated from wood chips obtained from individual wood processing households in Hexing Village, Sanyu Town, Tongzhou District, Nantong City. Take 5 grams of sawdust into a 250 ml sterilized Erlenmeyer flask containing 10 small glass beads, add 100 ml of sterile normal saline, shake and cultivate on a shaker at 30°C at 150 rpm for 20 minutes, and let stand for 2 hours; take the above bacteria suspension, dilute it by 10 -5 , 10 -6 , 10 -7 Take 100 microliters and smear it on the water-soluble aniline blue plate (composition of the water-soluble aniline blue plate, unit g / L: peptone 10, yeast extract 5, sodium chloride 5, aniline blue 2, agar 15, pH 7.0, 121°C Sterilize for 15 minutes), repeat each concentration three times, incubate at 30°C for 48 hours, select a single colony with a large transparent circle and purify it mu...

Embodiment 2

[0043] Embodiment 2 Rhodococcus ( Rhodococcus sp.) JB301 degradation of decolorized crystal violet

[0044] (1) Slant culture: Rhodococcus ( Rhodococcus sp.) JB301 was inoculated on the slant medium and cultured at 30°C for 48 hours. The composition of the slant medium used was (unit g / L): peptone 10, yeast extract 5, sodium chloride 5, agar 15, pH 7.0, sterilized at 121°C for 15 minutes.

[0045] (2) Seed culture: Use an inoculation loop to take a loop of the strain grown on the slant medium and insert it into the seed medium, cultivate at 30°C for 24 hours, and the shaker rotates at 150 rpm. The composition of the seed medium used for seed culture is (unit g / L): 10 peptone, 5 yeast extract, 5 sodium chloride, pH 7.0, 100 ml of seed medium in each 250 ml Erlenmeyer flask, and sterilized at 121°C for 15 minutes.

[0046] (3) Degradation and decolorization culture: Take 40 ml of the cultured seeds, put them in two 50 ml sterile centrifuge tubes, put 20 ml in each centrifug...

Embodiment 3

[0050] Embodiment 3 Rhodococcus ( Rhodococcus sp.) JB301 degradation of decolorized crystal violet

[0051] Get 40 milliliters of cultivated seeds, and the thalline collected is all transferred in 100 milliliters of Erlenmeyer flasks, wherein 40 milliliters of decolorization medium containing crystal violet is housed, decolorization medium pH 8.0, other conditions are with embodiment 2 As mentioned above, the degradation and decolorization rate of crystal violet reached 74.2% when the culture was continued for 8 hours at 35°C.

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Abstract

There is disclosed a chemically amplified positive resist composition to form a chemically amplified resist film to be used in a lithography, wherein the chemically amplified positive resist composition comprises at least, (A) a base resin, insoluble or poorly soluble in an alkaline solution, having a repeating unit whose phenolic ydroxyl group is protected by a tertiary alkyl group, while soluble in an alkaline solution when the tertiary alkyl group is removed; (B) an acid generator; (C) a basic component; and (D) an organic solvent, and a solid component concentration is controlled so that the chemically amplified resist film having the film thickness of 10 to 100 nm is obtained by a spin coating method. There can be provided, in a lithography, a chemically amplified positive resist composition giving a high resolution with a suppressed LER deterioration caused by film-thinning at the time of forming a chemically amplified resist film with the film thickness of 10 to 100 nm, and a resist patterning process using the same.

Description

technical field [0001] A rhodococcus strain and a method for degrading and decolorizing triphenylmethane dyes by using the strain belong to the technical field of microorganisms and fermentation. Background technique [0002] my country is a big country in dye production, with an annual output of more than 1.5 million tons of dye, occupying an important position in the world dye industry. Every year, 10%-20% of dyes are discharged into the environment along with wastewater. Due to the needs of industries such as textiles, most of the dyes used in practice are refractory aromatic compounds that are resistant to light and oxidation. These substances not only cause harm to the environment, but also are toxic and carcinogenic substances themselves. Human health also poses a threat. [0003] Triphenylmethane dyes are the third most used dyes after azo dyes and anthraquinone dyes, and are widely used in textile printing and dyeing, papermaking, leather and other industries. Tri...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C12N1/20A62D3/02C12R1/01A62D101/26
Inventor 丁重阳李国辉刘元法杨晔顾正华张梁石贵阳
Owner JIANGNAN UNIV
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