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Imprint apparatus, imprint method, imprint system, and device manufacturing method

A technology of transfer printing and pattern transfer, which is used in semiconductor/solid-state device manufacturing, measuring devices, instruments, etc., and can solve problems such as difficulty in detecting places where light does not emit from it, and reducing detection accuracy.

Inactive Publication Date: 2013-05-08
CANON KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

When light is emitted over the entire surface of the mold, it is difficult to detect where light is not emitted from, which may reduce detection accuracy

Method used

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  • Imprint apparatus, imprint method, imprint system, and device manufacturing method
  • Imprint apparatus, imprint method, imprint system, and device manufacturing method
  • Imprint apparatus, imprint method, imprint system, and device manufacturing method

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Embodiment Construction

[0018] Various exemplary embodiments, features, and aspects of the invention will be described in detail below with reference to the accompanying drawings.

[0019] A first exemplary embodiment will be described. Refer to the following figure 1 and figure 2 An imprint apparatus according to a first exemplary embodiment of the present invention will be described. figure 1 is a schematic diagram showing the imprint apparatus 100 according to the first exemplary embodiment of the present invention. Such as figure 1 As shown, each axis is determined in such a manner that the height direction of the imprint apparatus 100 is taken as the Z direction, and the plane on which the substrate W is arranged is taken as the XY plane.

[0020] The imprint apparatus 100 includes a light source 110 , a substrate holding unit 120 , a mold holding unit 130 , an alignment scope 140 , and a detection unit 200 . The imprint apparatus 100 also includes a supply unit 131 for supplying resin to ...

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Abstract

The invention relates to an imprint apparatus, an imprint method, an imprint system and a device for manufacturing method. The imprint apparatus that brings a pattern formed on a mold into contact with an imprint material supplied to a substrate to transfer the pattern to the imprint material includes an emission unit configured to emit excitation light for causing a luminescent material to emit light, a detection unit configured to detect light, and a mold holding unit configured to hold the mold including the luminescent material, in which, after the pattern is transferred to the imprint material, the emission unit emits the excitation light to the pattern transferred to the imprint material, and the detection unit detects light emitted from the luminescent material remaining in the imprint material.

Description

technical field [0001] The present invention relates to an imprint apparatus for inspecting a mold for transferring a pattern formed on the mold to an imprint material on a substrate. Background technique [0002] Pattern formation using imprint technology has been performed instead of the hitherto known pattern formation method using photolithography. The imprint technique is a technique of transferring a pattern to a resin by pressing a pattern-formed mold onto a substrate (wafer) provided with an imprint material (resin). [0003] If the pattern on the mold has a defect such as damage, the pattern transferred to the resin also has the defect. For this reason, it is necessary to inspect the pattern for defects such as damage to the mold. [0004] Japanese Patent Application Laid-Open No. 2007-296823 discusses a mold inspection method using a mold having a substance including a fluorescent agent adhered on its surface. The surface of the mold is irradiated with light to ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/00G01N21/956
CPCG03F7/0002G01N21/956G03F7/00G01N21/91B82Y10/00B82Y40/00G03F9/7042B29C33/42B29C59/021H01L21/0273B29C2043/5061
Inventor 饭村晶子铃木章义
Owner CANON KK