Apparatus for performing a plasma chemical vapor deposition process

A chemical vapor deposition and plasma technology, which is applied in gaseous chemical plating, electrical components, manufacturing tools, etc., can solve the problems of high power consumption, temporary attenuation or even disappearance of plasma, etc.
CN103122455BActive Publication Date: 2017-05-24DRAKA COMTEQ BV
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
DRAKA COMTEQ BV
Publication Date
2017-05-24

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Abstract

The invention relates to a device for performing a plasma chemical vapor deposition process. The device comprises a substantially cylindrical resonator provided with a cylindrical outer wall surrounding a resonant cavity having a substantially rotationally symmetrical shape with respect to the cylinder axis. The resonator also includes side wall portions bounding the resonant cavity in the direction of the opposite cylinder axis. Additionally, the device includes a microwave waveguide extending through the cylindrical outer wall into the resonant cavity. The length of the cavity in the direction of the cylinder varies according to the radial distance from the axis of the cylinder.
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Description

technical field

[0001] The present invention relates to a device for performing a plasma chemical vapor deposition process comprising a substantially cylindrical resonator provided with a cylindrical outer wall surrounding a resonant cavity having a substantially rotational axis with respect to the cylinder axis Symmetrical in shape, the resonator is also provided with side wall portions confining the resonant cavity along opposite cylindrical axis directions, wherein the device further includes a microwave waveguide portion, one end of which extends through the cylindrical outer wall into the resonant cavity. Background technique

[0002] European Patent Publication EP 1867610 in the name of Draka Comteq B.V. discloses such an apparatus for manufacturing optical fibers.

[0003] When high power microwaves are applied to long duration processes, problems with load matching can arise due to internal reflections and susceptibility to arcing. If the loads are not matched, the ...

Claims

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