Solid density measure method and method for detecting density qualification of target material

A density measurement, solid technology, applied in the field of measuring instruments, can solve the problem of low detection accuracy of target density, and achieve the effect of accurate method

Active Publication Date: 2014-07-09
KONFOONG MATERIALS INTERNATIONAL CO LTD
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  • Abstract
  • Description
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  • Application Information

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Problems solved by technology

[0006] The technical problem solved by the present invention is that the detection method of the existing target density has limitations, especially the detection accuracy of the target density is not high

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  • Solid density measure method and method for detecting density qualification of target material

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Embodiment Construction

[0046] After serious research and analysis, the inventor found that the reason for the low detection accuracy of the target density is:

[0047] The material of the target is a metal or hard alloy with high purity and excellent compactness, especially for the metal or hard alloy which requires very high compactness. In the process of manufacturing the target, the metal or hard alloy powder is sintered to form a denser metal or hard alloy. However, in the process of powder sintering and densification, it is easy to generate cavities inside the metal or cemented carbide, and then there are cavities inside the target formed by subsequent processing. If the target with more voids inside is not detected in the subsequent target density detection step and continues to be used in the sputtering process, it will not only affect the progress of the sputtering process, but also the quality of the film on the substrate will not be high. .

[0048]In the prior art, the target density is...

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Abstract

The invention provides a solid density measure method and a method for detecting density qualification of a target material. The solid density detection method comprises: providing a solid sample; measuring the mass of the solid sample in air as a first measure mass M0; submerging the solid sample in a liquid and measuring the mass of the solid sample in the liquid as a second measure mass M2; according to a formula of M0+rho<air>gV<sample>=M2+rho<liquid>gV<sample> to acquire the volume of the solid sample, wherein rho<air> is the density of air, rho<liquid> is the density of the liquid; and according to the volume of the solid sample and the real mass to acquire the density of the solid sample, wherein the real mass is M0+rho<air>gV<sample> or M2+rho<liquid>gV<sample>. The invention also provides the method for detecting the density of a target material is qualified. The solid density measure method disclosed by the invention is capable of improving the detection precision of the target material and improving the film plating quality in sputtering technology.

Description

technical field [0001] The invention relates to the technical field of measuring instruments, and relates to a method for measuring solid density and a method for checking whether the density of a target is qualified. Background technique [0002] Vacuum sputtering is a process in which electrons accelerate to the substrate under the action of an electric field and collide with argon atoms, ionizing a large number of argon ions and electrons, and the electrons fly to the substrate, and the argon ions accelerate bombardment sputtering under the action of an electric field The sputtering surface of the target on the base platform sputters a large number of target atoms, and the neutral target atoms (or molecules) are deposited on the substrate to form a film, and finally achieve the purpose of coating the substrate surface. [0003] More information about vacuum sputtering can also be found in the Chinese patent literature with publication number CN1109512A (publication date: ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N9/00G01N9/36
Inventor 姚力军相原俊夫大岩一彦潘杰王学泽李小萍
Owner KONFOONG MATERIALS INTERNATIONAL CO LTD
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