A kind of preparation method of metal nano-interdigital grating
A metal nano-interdigital technology, which is applied in the field of metal nano-interdigital grating preparation, can solve the problems of metal melting, narrow single-line scale, difficulty in ensuring grating lines, etc., and achieve the effect of changing the structural period and high processing precision
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Embodiment approach 1
[0029] Such as figure 1 As shown, a method for preparing a metal nano-interdigital grating provided in this embodiment includes the following steps:
[0030] Step A: On the cleaned substrate, a metal film of a certain thickness is grown using a coating device;
[0031] Step B: Spin-coat photoresist on the metal film, and prepare an interdigitated grating on the photoresist by electron beam lithography;
[0032] Step C: transferring the interdigitated grating to the metal film by ion beam etching;
[0033] Step D: wash away the residual glue on the metal film and the interdigital grating in hot acetone solution, and then use a microwave plasma remover to remove the residual organic matter.
[0034] In step A, the preparation of the substrate substrate is not limited, and may be quartz, silicon and other equivalent materials. Preferably, the substrate substrate is quartz or silicon.
[0035] In the cleaning process of the substrate substrate, the substrate substrate is cleane...
Embodiment approach 2
[0051] In this embodiment, a nano-gold interdigital grating on a silicon substrate is prepared. The period of the prepared interdigital grating is 200nm, the line width is about 80nm, and the slit width is about 120nm. Concrete preparation process is as follows:
[0052] 1) Take the cut silicon wafer and wash it with acetone, alcohol, and deionized water for 5 minutes each, then blow dry with a nitrogen gun, and bake on a hot plate at 180°C for 5 minutes.
[0053] 2) Use a thermal evaporation vacuum coating machine to grow 10nm Cr and 50nm Au on the cleaned silicon wafer, and the vacuum degree is 3.0×10 -4 Pa.
[0054] 3) Put the sample on the gluing platform and spin-coat PMMA, the rotation speed is 4000rpm, and the film thickness is about 210nm.
[0055] 4) Prepare an interdigitated grating on PMMA by electron beam lithography, select an appropriate exposure dose, the relative dose parameter is 2.0, develop for 40 seconds, and fix for 30 seconds.
[0056] 5) Transfer the...
Embodiment approach 3
[0059] Such as Figure 4 Shown is the preparation of nano-gold interdigital gratings on a quartz substrate in this embodiment. The period of the prepared interdigital grating is 200nm, the line width is about 80nm, and the slit width is about 120nm. Concrete preparation process is as follows:
[0060] 1) Take the cut quartz slices and wash them with acetone, alcohol, and deionized water for 5 minutes each, then dry them with a nitrogen gun, and bake them on a hot plate at 180°C for 5 minutes.
[0061] 2) Use a thermal evaporation vacuum coating machine to grow 5nm Cr and 30nm Au on the cleaned quartz sheet, and the vacuum degree is 3.0×10 -4 Pa.
[0062] 3) Put the sample on the gluing platform and spin-coat PMMA, the rotation speed is 4000rpm, and the film thickness is about 210nm.
[0063] 4) Prepare an interdigitated grating on PMMA by electron beam lithography, select an appropriate exposure dose, the relative dose parameter is 2.0, develop for 40 seconds, and fix for ...
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Abstract
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