Method for measuring trace elements of aluminum, chromium, copper, manganese, nickel and silicon in pure iron

A silicon element and trace technology, which is used in the preparation of test samples, thermal excitation analysis, material excitation analysis, etc., can solve the problems of impurity element content that cannot meet the detection requirements, high metrological verification cost, and difficulty in obtaining accurately. The effect of good application effect, avoidance of wrong analysis results, and easy operation

Inactive Publication Date: 2018-03-06
AVIC BEIJING INST OF AERONAUTICAL MATERIALS
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  • Claims
  • Application Information

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Problems solved by technology

[0004] Existing analysis methods use extraction and separation technology to separate matrix iron to determine traces in pure iron, but at present there is no direct determination of aluminum, chromium, copper, manganese, nickel and Silicon element report
[0005] The daily analysis method uses a volumetric flask to fix the volume, but due to the high price of the volumetric flask, the general laboratory requires the volumetric flask to pass the metrological verification before use. The cost of the metrological verification is higher than the price of the volumetric flask, so the volumetric flask is always used repeatedly.
No matter which cleaning method is used to clean this repeatedly used volumetric flask, the content of impurity elements cannot meet the detection requirements of trace elements with a detection limit as low as 0.0005%.
Therefore, it is difficult to accurately obtain aluminum, chromium, copper, manganese, nickel and silicon elements in pure iron with a content as low as 0.0005% by using a volumetric flask to dissolve.

Method used

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  • Method for measuring trace elements of aluminum, chromium, copper, manganese, nickel and silicon in pure iron
  • Method for measuring trace elements of aluminum, chromium, copper, manganese, nickel and silicon in pure iron
  • Method for measuring trace elements of aluminum, chromium, copper, manganese, nickel and silicon in pure iron

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Embodiment Construction

[0041] The above-mentioned and other technical features and advantages of the present invention will be described in more detail below in conjunction with the embodiments.

[0042] Determination of trace aluminum, chromium, copper, manganese, nickel and silicon elements in pure iron is measured on the following instrument: HJYULTIMA IIC inductively coupled plasma emission spectrometer is used, and the working conditions of the instrument are as follows: incident power 1050W; reflected power< 10W; cooling air flow rate 15L / min; sample lifting volume 1.5mL / min; integration time 5s;

[0043] Analytical line wavelength λ of the analytical element 0 and background points are:

[0044] Al analysis line wavelength λ 0 396.152nm, background points -0.02267nm and +0.02954nm;

[0045] Cr analysis line wavelength λ 0 267.716nm, background points -0.01669nm and +0.02584nm or analysis line wavelength λ 0 359.348nm, background points -0.03120nm and +0.02291nm;

[0046] Cu analysis lin...

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Abstract

The invention discloses a method for measuring the trace elements of aluminum, chromium, copper, manganese, nickel and silicon in pure iron. The method uses a purifying agent and comprises the steps of putting a sample in a plastic bottle, adding hydrochloric acid and nitric acid dropwise to dissolve, adding water to dilute until the net weight of a solution in the plastic bottle is 50.0 g, adopting a standard addition working curve series solution, subtracting the background on an inductive coupling plasma atomic emission spectrometer, measuring the content of an analysis element in a standard addition working curve sample, calculating the actual content of the analysis element in the working curve series solution, establishing a working curve without subtracting the background, and measuring the contents of the trace elements of aluminum, chromium, copper, manganese, nickel and silicon in the pure iron.

Description

technical field [0001] The invention relates to a method for measuring trace amounts of aluminum, chromium, copper, manganese, nickel and silicon in pure iron, and belongs to the technical field of metal material analysis. Background technique [0002] Pure iron is an important raw material for superalloys, and its content is relatively high in superalloys. The content in iron-based superalloys is as high as 40%, and the iron content in some brands of nickel-based superalloys can reach 20%. Therefore, the trace elements in pure iron The content directly affects the content of trace elements in superalloys. Therefore, controlling the content of trace elements in pure iron plays an important role in controlling the quality of trace elements in superalloys. [0003] ICP-AES has become one of the routine and powerful means of chemical analysis due to its excellent characteristics such as low detection limit, good precision, good stability, relatively few types of interference, ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/73G01N1/28
Inventor 李帆丁妍王强王志远
Owner AVIC BEIJING INST OF AERONAUTICAL MATERIALS
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