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The method of adjusting the inductance value of the inductance structure

A technology of inductance and inductance coil, applied in the field of adjusting the inductance value of the inductance structure, can solve the problems such as the inability to effectively adjust the inductance value of the inductance structure

Active Publication Date: 2020-07-17
SHANGHAI HUAHONG GRACE SEMICON MFG CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] The purpose of the present invention is to provide a method for adjusting the inductance value of the inductance structure to solve the problems in the prior art that the inductance value of the inductance structure cannot be effectively adjusted.

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  • The method of adjusting the inductance value of the inductance structure
  • The method of adjusting the inductance value of the inductance structure
  • The method of adjusting the inductance value of the inductance structure

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Embodiment Construction

[0023] The specific implementation manner of the present invention will be described in more detail below with reference to schematic diagrams. Advantages and features of the present invention will be apparent from the following description and claims. It should be noted that all the drawings are in a very simplified form and use imprecise scales, and are only used to facilitate and clearly assist the purpose of illustrating the embodiments of the present invention.

[0024] refer to figure 1 , which is a schematic diagram of the method for adjusting the inductance value of the inductance structure provided by the embodiment, such as figure 1 As shown, the method for adjusting the inductance value of the inductance structure includes:

[0025] S1: providing an inductance structure, the inductance structure includes a substrate, a conductive layer formed on the substrate, and a first dielectric layer formed on the conductive layer, and an inductance coil is formed in the firs...

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Abstract

The invention provides a method for adjusting an inductance structure inductance value. The inductance structure comprises a substrate, a conductive layer formed on the substrate, and a first dielectric layer formed on the conductive layer; an inductance coil is formed in the first dielectric layer; one conductive layer is formed between the substrate and the inductance coil; when a current flowsthrough the inductance coil, the substrate senses the inductive charge; the inductive charge generates an image current opposite to the coil current to apply a voltage to the conductive layer; and theinductive charge induced on the substrate can be changed by voltage boosting or bucking, so as to control the value of the image current, thereby finally changing the effective magnetic field strength and effective inductance structure inductance value.

Description

technical field [0001] The invention relates to the field of semiconductor manufacturing, in particular to a method for adjusting the inductance value of an inductance structure Background technique [0002] The inductor structure is an important passive component used in high-frequency electronic circuits, and its performance directly affects the performance of integrated circuits. The inductance value of the inductance structure is limited by fixed physical quantities such as the number of turns and length of the coil. Unless technologies such as MEMS suspension are used, there is currently no effective way to change these physical quantities to realize the change of the inductance structure inductance value. Another variable inductance structure is a circuit made of transistors (MOSFETs), capacitors (capacitors), etc. This circuit will hinder the change when the current changes suddenly, thereby producing an inductance structure effect, but this equivalent Inductive stru...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L23/522H01F21/02
CPCH01F21/02H01L23/5227H01L28/10
Inventor 黎坡
Owner SHANGHAI HUAHONG GRACE SEMICON MFG CORP